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Handbook of Surface and Interface Analysis: Methods for Problem-Solving,9780824700805
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Handbook of Surface and Interface Analysis: Methods for Problem-Solving


Author(s): Riviere; John C.
ISBN10:  0824700805
ISBN13:  9780824700805
Format:  Hardcover
Pub. Date:  1/27/1998
Publisher(s): CRC

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SummaryTable of ContentsEditorial Reviews
Hands-on resource discusses electron optical and scanned probe microscopy, high spatial resolution imaging, & synchrotron-based techniques & more, integrating the latest advances in instrumentation & methods to solving problems. DLC: Surface (Physics) Analysis.
Preface iii(18)
About the Contributors xxi
1. Introduction
1(8)
J. C. Riviere
S. Myhra
1. A spectrum of practitioners
1(2)
2. Trends in surface and interface science
3(2)
3. The intended audience
5(1)
4. The structure of the volume
5(4)
2. Elements of Problem-Solving
9(14)
S. Myhra
J. C. Riviere
1. Introduction
9(1)
2. Surface, interface, and bulk
9(2)
3. The problem-solving sequence
11(4)
3.1. Identification of the problem and formation of an initial hypothesis
11(1)
3.2. Identification of the essential variable(s)
12(1)
3.3. Reduction of the problem as far as possible without losing essential information
12(1)
3.4. Selection of the technique(s) likely to provide the crucial information by the most reliable and economic route
12(1)
3.5. Choice of methodology(ies) consistent with the selection of technique(s)
13(1)
3.6. Acquisition and processing of data of adequate quantity and quality
13(1)
3.7. Interpretation of the data
14(1)
3.8. Review and evaluation
14(1)
3.9. Presentation
14(1)
4. Practical matters in problem-solving for surfaces and interfaces
15(8)
4.1. Specimen handling, preparation and configuration
15(4)
4.1.1. Ex situ preparation
16(1)
4.1.2. In situ preparation
16(2)
4.1.3. Specimen configuration
18(1)
4.2. Technique destructiveness
19(1)
4.3. Quality assurance, best practice and good housekeeping
20(3)
3. How to Use This Book
23(34)
S. Myhra
J. C. Riviere
1. Introduction
23(1)
2. Definitions
23(1)
3. Decision-making in problem-solving
24(2)
4. Acronyms and jargon
26(5)
Table 4.1: Acronyms: Techniques for surfaces and interfaces
29(2)
Table 4.2: Acronyms: Surface and interface methodologies
31(1)
Table 4.3: Acronyms and trade names: Compounds
32(1)
Table 4.4: Acronyms: Miscellaneous
33(1)
Table 4.5: Definitions: Miscellaneous
33
5. Finding the information
31(26)
Table 4.6: Choices and decisions: Specimen configuration and preparation
34(1)
Table 4.7: Choices and decisions: Instrumental aspects
35(2)
Table 4.8: Surface and interface techniques: Information and methods
37(3)
Table 4.9: Surface and interface techniques: Characteristics and attributes
40(6)
Table 4.10: Classes, functions and applications of materials: Key words and locations
46(11)
4. Spectroscopic Techniques: X-Ray Photoelectron Spectroscopy, Auger Electron Spectroscopy, and Ion Scattering Spectroscopy
57(102)
Gar B. Hoflund
1. X-ray photoelectron spectroscopy (XPS)
57(34)
1.1. Introduction and history
57(6)
1.2. Experimental equipment and data collection
63(12)
1.2.1. X-ray sources
63(3)
1.2.2. Energy analyzers
66(3)
1.2.3. Energy calibration
69(2)
1.2.4. Data processing
71(1)
1.2.5. Sample configuration
72(1)
1.2.6. Sample treatment
73(2)
1.3. Spectral features and interpretation
75(11)
1.3.1. Determination of composition from XPS data
75(3)
1.3.2. Determination of chemical state
78(7)
1.3.3. Additional features in XPS spectra
85(1)
1.4. Spatially resolved XPS
86(5)
2. Auger electron spectroscopy (AES)
91(30)
2.1. Introduction and history
91(4)
2.2. Experimental equipment and data collection
95(4)
2.2.1. Electron sources
95(1)
2.2.2. Energy analyzers
95(4)
2.3. Spectral features and interpretation
99(7)
2.4. Associated methodologies
106(15)
2.4.1. Depth profiling with AES
106(5)
2.4.2. Angle-resolved AES (ARAES)
111(7)
2.4.3. Scanning Auger microscopy (SAM)
118(3)
3. Ion scattering spectroscopy (ISS)
121(31)
3.1. Introduction and history
121(5)
3.2. Experimental equipment and data collection
126(4)
3.3. Spectral features and interpretation
130(22)
3.3.1. General features
130(2)
3.3.2. Background and neutralization
132(2)
3.3.3. Multiple scattering
134(1)
3.3.4. Multiply charged ion scattering
135(1)
3.3.5. Choice of primary ion
136(3)
3.3.6. Hydrogen and carbon
139(2)
3.3.7. Elemental sensitivity
141(3)
3.3.8. Energy resolution
144(3)
3.3.9. Peak shape
147(1)
3.3.10. Quantification
148(2)
3.3.11. Data processing
150(1)
3.3.12. Depth profiling
151(1)
References
152(7)
5. Compositional Analysis by Auger Electron and X-ray Photoelectron Spectroscopy
159(50)
Graham C. Smith
1. Introduction
159(2)
2. Spectral interpretation
161(21)
2.1. XPS spectra
161(16)
2.1.1. Elemental line energies
161(4)
2.1.2. Photoelectron line shapes
165(5)
2.1.3. Chemical shifts
170(4)
2.1.4. Curve fitting
174(3)
2.2. Auger electron spectra
177(3)
2.2.1. Elemental line energies
177(2)
2.2.2. Chemical shifts
179(1)
2.3. X-ray-excited Auger electron spectra
180(2)
3. Quantitative of structural analysis
182(23)
3.1. Quantification and homogeneous samples
183(17)
3.1.1. Use of sensitivity factors
183(1)
3.1.2. Measurement of intensity
184(5)
3.1.3. Modified sensitivity factors for improved quantification
189(9)
3.1.3.1. Quantification of XPS data
189(6)
3.1.3.2. Quantification of AES data
195(3)
3.1.4. Statistical errors in quantification
198(2)
3.2. Analysis of specimens with spatially varying compositions
200(1)
3.3. Analysis of specimens with compositional variations in depth
201(4)
References
205(4)
6. Ion Beam Techniques: Surface Mass Spectrometry
209(46)
Birgit Hagenhoff
Derk Rading
1. Principles
209(17)
1.1. Physical effects of ion induced sputtering
210(2)
1.1.1. Sputtering
210(1)
1.1.2. Ionization
211(1)
1.1.3. Formation of molecular species
211(1)
1.2. Instrumentation
212(5)
1.2.1. Primary-ion bombardment
212(2)
1.2.2. Mass analyzers
214(1)
1.2.3. Add-ons
215(2)
1.3. Typical spectra
217(4)
1.3.1. Typical characteristics of SSIMS spectra
217(3)
1.3.2. Typical characteristics of SNMS spectra
220(1)
1.4. Useful definitions in SSIMS and SNMS
221(3)
1.4.1. General
221(1)
1.4.2. SSIMS
222(1)
1.4.3. SNMS
223(1)
1.5. Use of noble metal substrates
224(1)
1.6. Performance summary
225(1)
2. Operational methodology
226(13)
2.1. The analytical question
226(1)
2.2. Spatial location
227(3)
2.3. Identification and peak assignment
230(2)
2.4. Quantification
232(7)
2.4.1. Use of internal standards
233(2)
2.4.2. (Sub)monolayer coverages
235(2)
2.4.3. Organic multilayers
237(2)
3. Problem solving
239(10)
3.1. Defects in car paint
239(3)
3.2. CI diffusion in polymer materials
242(1)
3.3. Monitoring of surface modifications
243(3)
3.4. Residues on glass
246(3)
4. Summary and outlook
249(2)
References
251(4)
7. In-depth Analysis: Methods for Depth Profiling
255(42)
F. Reniers
1. Introduction
255(5)
2. Sample preparation
260(1)
3. Nondestructive in-depth analysis
260(6)
3.1. Rutherford backscattering spectrometry (RBS)
260(3)
3.1.1. Basic principles
260(1)
3.1.2. Quantitative analysis
261(1)
3.1.3. Application of RBS
262(1)
3.2. Angle-resolved AES and XPS
263(3)
3.2.1. Basic principles
263(2)
3.2.2. Applications
265(1)
3.2.3. Summary
265(1)
4. Destructive depth profiling
266(22)
4.1. Ion guns
266(1)
4.2. AES and XPS
266(13)
4.2.1. Basic principles
267(1)
4.2.2. Quantitative analysis
267(2)
4.2.3. Depth determination-conversion
269(1)
4.2.4. Depth resolution
269(2)
4.2.4.1. Improvement in AES sputter depth profiling
269(2)
4.2.5. Summary of optimized depth profiling conditions for AES/XPS
271(2)
4.2.6. Improvement of depth resolution by sample rotation
273(1)
4.2.7. Chemical depth profiles using AES
273(6)
4.3. Glow discharge optical emission spectroscopy (GDOES)
279(3)
4.3.1. Basic principles
279(1)
4.3.2. Quantitative analysis
279(1)
4.3.3. Recent improvements in GDOES
280(2)
4.4. SIMS
282(3)
4.4.1. Basic principles
282(1)
4.4.2. Quantitative analysis
282(1)
4.4.3. Applications
283(1)
4.4.4. Optimum conditions for performing SIMS depth profiling
284(1)
4.4.4.1. Bombarding conditions: ions
284(1)
4.4.4.2. Angle of incidence
284(1)
4.4.4.3. Effect of the choice of gas in SIMS
284(1)
4.4.4.4. Choice of ion beam energy
285(1)
4.4.4.5. Interferences in SIMS depth profiling
285(1)
4.5. SNMS
285(3)
4.5.1. Basic principles
285(2)
4.5.2. Quantification in SNMS
287(1)
4.5.3. Applications
288(1)
5. Discussion and general conclusion
288(2)
5.1. Typical problems that might be encountered when sputter profiling, and their solutions
289(1)
5.2. Key parameters/considerations for choice of the appropriate analysis method
289(1)
References
290(7)
8. Ion Beam Effects in Thin Surface Films and Interfaces
297(50)
I. Bertoti
M. Menyhard
A. Toth
1. Introduction
297(3)
2. Low-energy atomic mixing
300(13)
2.1. Auger depth profiling
301(5)
2.1.1. Multilayer systems
301(1)
2.1.2. High-resolution depth profiling equipment
301(3)
2.1.3. Characteristic depth profiles
304(2)
2.2. Evaluation of Auger depth profiles
306(3)
2.2.1. Sputtering-induced surface roughness
306(2)
2.2.2. Intrinsic surface roughness of interfaces
308(1)
2.2.3. Calculation of the surface concentration
308(1)
2.3. Atomic mixing
309(4)
2.3.1. Energy dependence of ion mixing
310(1)
2.3.2. Interpretation of the depth profiles
310(3)
3. Particle-beam-induced chemical alterations
313(27)
3.1. Thin surface films of inorganic compounds
314(18)
3.1.1. TiN layers
314(10)
3.1.2. Metal oxides
324(3)
3.1.3. Cr-O-Si cermet films
327(5)
3.2. Thin surface films of polymers
332(8)
3.2.1. Aromatic poly(ether sulfone)
335(1)
3.2.2. Aromatic polyimide
336(2)
3.2.3. Organosilicon polymers
338(2)
References
340(7)
9. Surface Modification by Ion Implantation
347(48)
D. M. Ruck
1. Introduction
347(3)
2. Physical processes
350(4)
3. Ion implantation: instrumentation and procedures
354(1)
4. Methods for characterisation of implanted layers
355(13)
4.1. Phase analysis by Mossbauer spectroscopy
360(8)
4.1.1. General aspects
360(1)
4.1.2. Depth-selective CEMS
361(7)
5. Examples of the application of ion implantation
368(20)
5.1. Improved surface properties in medical endoprothesis
369(8)
5.1.1. Introduction
369(1)
5.1.2. Results
370(6)
5.1.3. Discussion and conclusions
376(1)
5.2. Modification of chromium layers by nitrogen ion implantation
377(4)
5.2.1. Introduction
377(1)
5.2.2. Experimental procedures
377(1)
5.2.3. Results
377(3)
5.2.4. Conclusions
380(1)
5.3. Waveguide structures by ion irradiation of polymeric materials
381(7)
5.3.1. Introduction
381(2)
5.3.2. Generation of um structures
383(3)
5.3.3. Buried waveguide layers
386(1)
5.3.4. Coupling between device and fiber: fiber-chip coupling
387(1)
5.3.5. Conclusions and further developments
387(1)
References
388(7)
10. Introduction to Scanned Probe Microscopy
395(52)
S. Myhra
1. Introduction
395(7)
1.1. Essential elements of SPM
397(1)
1.2. Brief history of SPM
398(1)
1.3. The SPM family tree
398(4)
2. Physical principles
402(8)
2.1. STM/STS
402(5)
2.2. SFM
407(1)
2.3. Force-distance spectroscopy
407(3)
3. Technical implementation of SPM instrumentation
410(7)
3.1. Generic features and elements
410(2)
3.2. Spatial positioning and control
412(2)
3.3. Gap control loop
414(1)
3.4. Raster implementation and control
415(1)
3.5. Noise and drift management
415(1)
3.6. Environmental control
416(1)
3.7. Data management
417(1)
4. Specifics for some SPM techniques
417(23)
4.1. STM/STS specifics
417(4)
4.2. SFM specifics
421(4)
4.3. SFM probes: general considerations
425(1)
4.4. SFM probes: design criteria
425(2)
4.5. Probe calibration and image artefacts
427(1)
4.6. Determination of normal spring constant
428(3)
4.7. Determination of lateral spring constant
431(2)
4.8. Resonance frequency
433(1)
4.9. Aspect ratio
433(1)
4.10. Radius of curvature of tip
434(6)
4.11. Determination of tip height and tilt
440(1)
5. Problem-solving with SPM
440(3)
5.1. Manipulation on the nanoscale with SPM
442(1)
References
443(4)
11. Metallurgy
447(38)
R. K. Wild
1. Introduction
447(7)
1.1. Strength of materials
448(1)
1.2. Failure mechanisms
449(1)
1.3. Segregation
449(5)
1.3.1. Thermal
449(5)
1.3.2. Irradiation assisted
454(1)
2. Analytical methods for determining grain boundary segregation
454(23)
2.1. Introduction
454(1)
2.2. Metallographically polished specimens
455(4)
2.2.1. Chemical etching
455(2)
2.2.2. SIMS
457(1)
2.2.3. Autoradiography
458(1)
2.3. Intergranular fracture
459(12)
2.3.1. Impact at low temperature.
459(6)
2.3.1.1. AES
460(5)
2.3.1.2. XPS
465(1)
2.3.2. Hydrogen charging
465(6)
2.3.2.1. Charging methods
465(3)
2.3.2.2. Impact and slow tensile fracture
468(3)
2.4. Transmission electron microscopy
471(6)
2.4.1. Production of a thin foil
471(2)
2.4.2. Field emission gun STEM
473(4)
2.4.2.1. Parallel electron energy loss spectroscopy
473(1)
2.4.2.2. Energy dispersive X-ray analysis
474(2)
2.4.2.3. Comparison of AES and FEGSTEM
476(1)
2.4.3. Time-of-flight atom probe
477(1)
3. Cracks in metals and alloys
477(4)
References
481(4)
12. Microelectronics and Semiconductors
485(58)
E. Paparazzo
1. Introduction
485(2)
2. Techniques
487(6)
2.1. Surface specificity
487(2)
2.2. Elemental specificity
489(1)
2.3. Chemical sensitivity
489(1)
2.4. Destructiveness
490(1)
2.5. Quantification
491(1)
2.6. Spatial resolution
491(1)
2.7. Surface charging and other considerations
492(1)
3. Josephson junctions
493(7)
3.1. Problem specification
493(1)
3.2. Experimental approach: choice of techniques and specimen configuration
493(1)
3.3. Results
494(5)
3.3.1. AES analysis
494(2)
3.3.2. XPS analysis
496(3)
3.4. Discussion
499(1)
4. Oxidation of InxGa(1-x)AsyP(1-y) semiconductors by NO(2)
500(9)
4.1. Problem specification
500(1)
4.2. Experimental approach: choice of technique and specimen configuration
501(1)
4.3. Results
501(7)
4.3.1. AES analysis
501(2)
4.3.2. SAM and scanning ELS analysis
503(5)
4.4. Discussion
508(1)
5. Si/SiO(2) interface
509(16)
5.1. Problem specification
510(1)
5.2. Experimental approach: choice of technique and specimen configuration
511(1)
5.3. Results
511(10)
5.3.1. Effects of Ar(+) bombardment
511(4)
5.3.2. Interfacial suboxides
515(1)
5.3.3. Surface-hydrated species
516(5)
5.4. Discussion
521(4)
5.4.1. Effects of Ar(+) bombardment and suboxides
521(3)
5.4.2. Surface-hydrated species
524(1)
6. InP/SiO2 system
525(12)
6.1. Problem specification
525(1)
6.2. Experimental approach: choice of technique and specimen configuration
525(1)
6.3. Results
526(3)
6.4. Discussion
529(8)
References
537(6)
13. Minerals, Ceramics, and Glasses
543(62)
R. St. C. Smart
1. Introduction
543(2)
2. Information required: analytical techniques
545(1)
3. Analysis strategy
545(7)
4. Minerals
552(24)
4.1. Phase structures
552(6)
4.2. Surface structures
558(8)
4.3. Surface sites
566(2)
4.4. Grain boundaries and intergranular films
568(2)
4.5. Depth profiles
570(1)
4.6. Adsorption
570(3)
4.7. Surface reactions
573(1)
4.8. Surface modification
574(2)
5. Ceramics
576(10)
5.1. Phase structures
576(2)
5.2. Surface structures
578(1)
5.3. Surface sites
579(1)
5.4. Grain boundaries and intergranular films
580(1)
5.5. Depth profiles
581(1)
5.6. Adsorption
582(3)
5.7. Surface reactions
585(1)
5.8. Surface modification
585(1)
6. Glasses
586(12)
6.1. Surface composition
586(3)
6.2. Surface sites
589(1)
6.3. Depth profiles
589(1)
6.4. Adsorption
590(1)
6.5. Surface reactions
591(5)
6.6. Surface modification
596(2)
References
598(7)
14. Composites
605(38)
P. M. A. Sherwood
1. Introduction
605(1)
2. Presenting fibers for surface analysis
606(3)
2.1. Presentation of multiple fibers for analysis
606(1)
2.2. Problems in the study of conducting fibers
607(2)
2.3. The question of fiber decomposition
609(1)
3. Presenting composites for surface analysis
609(1)
4. Surface analytical techniques for composites and fibers
610(4)
4.1. X-ray diffraction
610(1)
4.2. FTIR and Raman spectroscopies
611(1)
4.3. SEM
612(1)
4.4. STM and AFM
612(1)
4.5. Wavelength dispersive X-ray emission in an electron microprobe
612(1)
4.6. Surface energy
613(1)
4.7. Titrimetric methods
613(1)
4.8. Mass spectrometry
614(1)
4.9. SIMS
614(1)
4.10. Ion scattering spectroscopy
614(1)
5. X-ray photoelectron spectroscopic studies of composites and fibers
614(24)
5.1. Introduction
614(2)
5.2. The question of surface charging
616(2)
5.3. Depth profiling of carbon composites and fibers
618(1)
5.4. Decomposition of surface functionality during spectral collection
619(2)
5.5. XPS data analysis and interpretation of core chemical shifts
621(11)
5.5.1. Fitting C Is spectra
622(3)
5.5.2. Detailed fitting considerations
625(3)
5.5.3. The use of monochromatic X-radiation
628(2)
5.5.4. Fitting O 1s spectra
630(1)
5.5.5. Fitting N 1s spectra
631(1)
5.6. Interpreting the valence-band spectrum
632(4)
5.6.1. Using calculations to predict valence-band spectra
633(1)
5.6.2. Understanding the valence-band spectra of carbon fibers
633(2)
5.6.3. The use of UV rather than X-radiation
635(1)
5.7. Interfacial studies
636(2)
6. Concluding comments
638(2)
References
640(3)
15. Corrosion and Surface Analysis: An Integrated Approach Involving Spectroscopic and Electrochemical Methods
643(54)
N. S. Mclntyre
R. D. Davidson
I. Z. Hyder
A. M. Brennenstuhl
1. Introduction
643(3)
1.1. Types of corrosion process
644(1)
1.2. Corrosion and surfaces
645(1)
2. Protocols for corrosion film analysis
646(22)
2.1. Preliminary sample handling
646(1)
2.2. Contaminants
647(1)
2.3. Preliminary examination
648(2)
2.4. Cross sectioning of oxide surface films
650(3)
2.5. Pressure restrictions on sample analysis
653(1)
2.6. SEM and EDS analyses
653(3)
2.7. XPS
656(5)
2.8. AES
661(4)
2.9. SIMS
665(2)
2.10. Other methods
667(1)
3. Background to the problem: A working hypothesis
668(1)
4. Experimental strategy
669(2)
5. Electrochemical techniques for surface corrosion studies
671(3)
5.1. Basic electrode kinetics
671(1)
5.2. Electrochemical techniques
672(2)
5.2.1. Linear polarization
672(1)
5.2.2. Anodic polarization
672(1)
5.2.3. Electrochemical impedance spectroscopy
673(1)
6. Results and assessment
674(19)
6.1. Initial characterization
674(1)
6.2. Boiler simulation corrosion experiments
675(4)
6.3. Contrived corrosion experiments on Monel
679(14)
6.3.1. Electrochemical measurements at pH 10
679(3)
6.3.2. Microscopy studies of oxides from pH 10 exposures
682(1)
6.3.3. Elemental and chemical compositions of oxides formed at pH 10
683(7)
6.3.4. Electrochemical and microscopy studies of alloys exposed to pH 1
690(3)
7. Conclusions
693(3)
References
696(1)
16. Problem-Solving Methods in Tribology with Surface-Specific Techniques
697(50)
C. Donnet
1. Tribology and surface-related phenomena
697(3)
2. Surface analysis requirements for tribology
700(14)
2.1. Overview
700(2)
2.2. Dimensional criterion
702(1)
2.3. Time-scale criterion
703(3)
2.4. Information criterion
706(8)
2.4.1. Physicochemical and structural information
707(4)
2.4.2. Surface morphology
711(1)
2.4.3. Physical, mechanical and frictional surface and interface properties
712(2)
3. Generic studies
714(27)
3.1. Ultrathin boundary lubricant films
714(3)
3.2. Tribochemistry of antiwear additives in boundary lubrication
717(5)
3.2.1. Ex situ surface analytical investigations
717(2)
3.2.2. In vivo pre mortem surface analytical investigations
719(1)
3.2.3. In situ post mortem surface analytical investigations in Ultrahigh Vacuum
720(2)
3.3. Tribochemical activity of nascent surfaces
722(2)
3.4. Influence of the nature of the surface on the tribochemistry of various tribo-materials
724(3)
3.5. Effect of adsorbate monolayers on dry friction
727(2)
3.6. Tribochemistry of SiC/SiC under a partial pressure of oxygen
729(2)
3.7. Relationship of durability to microstructure of IBAD MoS(2) coatings
731(1)
3.8. Frictionless sliding of pure MoS(2) in UHV
732(5)
3.9. Tribology of carbonaceous coatings
737(3)
3.10. Tribochemistry of C(60) coatings
740(1)
4. Synthesis and conclusion
741(2)
Acronyms
743(1)
References
744(3)
17. Catalyst Characterization
747(34)
W. E. S. Unger
T. Gross
1. Introduction
747(2)
2. Applicability of surface spectroscopies in catalyst characterization
749(3)
3. Sample damage
752(1)
4. Sample preparation
753(3)
5. Charging of insulator surfaces by the probe
756(1)
6. Chemical-state analysis with XPS by fingerprinting and reference to databases or chemical-state plots
757(9)
7. Chemical state analysis with SIMS by fingerprinting
766(3)
8. Miscellaneous
769(3)
8.1. The molecular probe approach: assessment of acid-base properties
769(1)
8.2. Alloying at bimetallic supported catalysts
770(1)
8.3. In-depth analysis
771(1)
9. Quantitative surface analysis of catalysts: composition, dispersion and coverage
772(4)
References
776(5)
18. Adhesion Science and Technology
781(54)
J. F. Watts
1. Introduction
781(1)
2. Characteristics of the solid substrate
782(6)
2.1. Organic contamination
783(1)
2.2. Oxide films at metal surfaces
784(3)
2.3. Carbon fiber composite materials
787(1)
3. Failure analysis: identification of the locus of failure
788(20)
3.1. Adhesion to brass
789(2)
3.2. Adhesion of organic coatings to steel
791(8)
3.3. Zinc surfaces
799(1)
3.4. Aluminum alloys
800(2)
3.5. Composite materials
802(2)
3.6. Ceramics
804(3)
3.7. Summary
807(1)
4. Probing the buried interface
808(3)
5. Organosilane adhesion promoters
811(3)
6. Acid-base interactions in adhesion
814(9)
6.1. Evaluation of acid-base interactions in adhesion
814(2)
6.2. The XPS chemical shift and acid-base interactions
816(1)
6.3. The use of vapor phase probes for the determination of -XXXH(AB)
817(1)
6.4. Quantitative acid-base characteristics of the polymer
818(4)
6.5. Acid-base properties of inorganic surfaces
822(1)
6.6. Concluding remarks
823(1)
7. Computer chemistry and molecular modeling
823(2)
8. Future prospects
825(3)
References
828(7)
19. Archaeomaterials
835(36)
E. Paparazzo
1. Introduction
835(1)
2. Choice of techniques for the study of archeomaterials
836(1)
2.1. Bulk techniques
836(1)
2.2. Surface-specific techniques: XPS and SAM
836(1)
3. Roman lead pipe fistula
837(20)
3.1. Description of material and specimen
837(1)
3.2. Results
838(14)
3.3. Discussion
852(5)
4. Roman leaded bronzes
857(11)
4.1. Specification of the problem
857(1)
4.2. Results
857(10)
4.3. Discussion
867(1)
References
868(3)
Appendix 1. Physical Constants and Conversion Factors
871(2)
Appendix 2. Data for the Elements and Isotopes
873(12)
Appendix 3. Less Commonly Used Techniques for Analysis of Surfaces and Interfaces
885(18)
Gar B. Hoflund
J. C. Riviere
1. Ultraviolet photoemission spectroscopy (UPS)
885(4)
References
888(1)
2. Electron energy loss spectroscopy (ELS)
889(3)
References
892(1)
3. Electron-stimulated desorption (ESD)
892(5)
References
897(1)
4. Vibrational spectroscopies
897(5)
4.1. Infrared techniques
897(2)
4.1.1. Attenuated total reflectance (ATR)
898(1)
4.1.2. Reflection absorption infrared spectroscopy (RAIRS)
898(1)
4.2. Electron impact technique
899(3)
4.2.1. High-resolution electron energy loss spectroscopy (HREELS)
899(3)
References
902(1)
Appendix 4. Core-Level Binding Energies, Auger Kinetic Energies, and Modified Auger Parameters for Some Chemical Elements in Various Compounds
903(4)
References
905(2)
Appendix 5. Documentary Standards in Surface Analysis: The Way of the Future?
907(22)
S. J. Harris
1. Introduction
907(2)
2. ISO technical committee 201 on surface chemical analysis
909(15)
2.1. Structure of ISO technical committee 201
909(2)
2.2. ISO technical committee 201 sub-committees
911(13)
2.3. ISO TC201 Working Groups
924(1)
3. Conclusions
924(3)
References
927(2)
Index 929
Twenty-four contributors from universities, industry, and government from around the Western world have brought their expertise together to create a much needed handbook on surface analysis. As the title reflects, the primary aim of the editors was to provide a spectrum of practitioners with a reasonably-sized book which would provide a methodological way to study and solve surface-related problems. Each of the 16 chapters starts with "some general materials science questions that could arise in surface/interface science and technology, the user will be guided to ever more detailed and specific levels of questions...there will be descriptions of the principal surface specific techniques...the reader will be directed to whichever chapter (or chapters) is appropriate to the problem, and will find...the most productive methodology(ies)..." The reader is advised to consult the 57 pages on how to best use the book. Each chapter features a multitude of figures and tables, but most of the references are regrettably before the 1990s. This handbook is recommended for large academic science libraries.Reviewer: Jan Figa, Reference Librarian, Illinois Institute of Technology Paul V. Galvin Library, jfiga@charlie.cns.iit.eduCopyright 2000 YBP Library Services

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