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9783540004141

Transmission Electron Microscopy of Semiconductor Nanostructures: An Analysis of Composition and Strain State

by
  • ISBN13:

    9783540004141

  • ISBN10:

    3540004149

  • Format: Hardcover
  • Copyright: 2003-05-01
  • Publisher: Springer Verlag
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Summary

This book provides tools well suited for the quantitative investigation of semiconductor electron microscopy. These tools allow for the accurate determination of the composition of ternary semiconductor nanostructures with a spatial resolution at near atomic scales. The book focuses on new methods including strain state analysis as well as evaluation of the composition via the lattice fringe analysis (CELFA) technique. The basics of these procedures as well as their advantages, drawbacks and sources of error are all discussed. The techniques are applied to quantum wells and dots in order to give insight into kinetic growth effects such as segregation and migration. In the first part of the book the fundamentals of transmission electron microscopy are provided. These are needed for an understanding of the digital image analysis techniques described in the second part of the book. There the reader will find information on different methods of composition determination. The third part of the book focuses on applications such as composition determination in InGaAs Stranski--Krastanov quantum dots. Finally it is shown how an improvement in the precision of the composition evaluation can be obtained by combining CELFA with electron holography. This is demonstrated for an AlAs/GaAs superlattice.

Table of Contents

Introduction
1(12)
Strain State Analysis [7, 8, 9, 10]
2(1)
CELFA [7, 25, 26, 27, 28]
3(1)
Organization of the Book
4(9)
References
6(7)
Part I Theoretical Fundamentals of Transmission Electron Microscopy
Electron Diffraction
13(20)
Single-Atom Electron Scattering
13(4)
The Integral Form of the Schrodinger Equation
13(2)
The Atomic Scattering Amplitude for Electrons
15(2)
Kinematical Approximation
17(7)
The Structure Amplitude
17(1)
The Lattice Amplitude
18(1)
The Thin-Foil Specimen
19(2)
Chemical Sensitivity
21(3)
The Block Wave Approach
24(5)
Channeling Theory
29(4)
References
31(2)
Image Formation
33(24)
Nonlinear Coherent Imaging
33(5)
Influence of Aberrations and Defocus of the Objective Lens
34(2)
Nonlinear Imaging Theory
36(2)
Effects of Incoherence
38(8)
Spatial Incoherence
38(2)
Temporal Incoherence
40(2)
The Transmission Cross-Coefficients
42(1)
Delocalization
42(4)
Reconstruction of the Electron Wave Function
46(11)
Focal-Variation Reconstruction
47(2)
Off-Axis Electron Holography
49(4)
References
53(4)
Part II Digital Image Analysis
Strain State Analysis
57(30)
Displacements and Lattice Spacings
57(12)
Noise Reduction
58(2)
Detection of Lattice Sites and Gridding
60(4)
Calculation of Lattice Base Vectors
64(1)
Local Displacements and Lattice Spacings
65(2)
Averaged Displacements and Lattice Spacings
67(2)
Determination of the Specimen Thickness
69(8)
Cell Transformation
69(2)
Determination of Relative Thickness Values
71(4)
Determination of Absolute Thickness Values
75(2)
Elastic Relaxation and Finite-Element Calculation
77(10)
The Analytical Solution of the Thin- and Thick-Sample Limits
77(3)
Finite-Element Calculations
80(4)
References
84(3)
Lattice Fringe Analysis
87(52)
On the Basic Ideas Behind CELFA
87(7)
General Aspects and Definitions
87(3)
Discussion of Optimum Imaging Conditions
90(3)
Fringe Images
93(1)
Theoretical Considerations
94(8)
Calculation of Reflection Amplitudes
94(5)
Determination of Sample Thickness and Phase φ
99(3)
Practical Considerations
102(22)
Measurement Procedure
102(3)
Example of an Evaluation
105(3)
Alternative Methods and Noise Reduction
108(8)
Errors Due to Objective Lens Aberrations
116(3)
Errors Due to Specimen Thickness Uncertainties
119(5)
Strain Effects
124(9)
Variation of Lattice Parameter
126(2)
Method for Simulation of Strain Effects
128(4)
Beam Amplitudes and the Effect of Strain
132(1)
Nonrandom Distribution of Elements
133(6)
References
136(3)
Part III Applications
Introduction
139(8)
Stranski--Krastanov Growth Mode
139(2)
Segregation in III--V Ternary Alloys
141(6)
References
144(3)
In0.6Ga0.4As/GaAs(001) SK Layers
147(22)
Experimental Setup
147(1)
Experimental Results
148(11)
Uncapped Samples
148(4)
Capped Samples
152(7)
Discussion and Conclusions
159(7)
Strain-Induced Migration of Ga
160(1)
Bulk Interdiffusion
161(1)
Segregation
162(1)
Growth Model
163(2)
Correlation with PL Results
165(1)
Composition Distribution in Free-Standing Islands
165(1)
Summary
166(3)
References
167(2)
InAs Quantum Dots
169(24)
Experimental Setup
169(2)
Experimental Results
171(13)
Conventional Transmission Electron Microscopy
171(1)
Investigation of Uncapped Islands
172(7)
Investigation of Capped Samples
179(4)
Combination of the Results
183(1)
Discussion
184(7)
Correlation Between TEM and PL Data
184(1)
Segregation Efficiency
185(1)
Segregation Models
185(4)
Modeling
189(1)
Segregation and Mass Transport of Ga
190(1)
Conclusion
191(2)
References
191(2)
Electron Holography: AlAs/GaAs Superlattices
193(16)
Experimental Setup
193(1)
Description of the Method
194(9)
Imaging Condition
194(2)
Experimental Details
196(3)
Delocalization
199(1)
Iterative Computation of the Composition
200(3)
Discussion
203(4)
Conclusion
207(2)
References
207(2)
Outlook
209(2)
Appendices
211(6)
A List of Acronyms Used
213(2)
References
214(1)
B Fourier Transform, Convolutions and δ-``Function''
215(2)
B.1 Fourier Transform
215(1)
B.2 Convolution
215(1)
B.3 δ-``Function''
216(1)
References
216(1)
Color Plates 217(18)
Index 235

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