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9783540640387

Nitride Semiconductors and Devices

by
  • ISBN13:

    9783540640387

  • ISBN10:

    354064038X

  • Format: Hardcover
  • Copyright: 1999-11-01
  • Publisher: Springer Verlag
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Supplemental Materials

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Summary

This is a unique book devoted to the important class of nitride semico nductors and devices. Numerous tables and figures detailing properties and performance devices are compiled. Structural, electrical and opti cal properties of nitrides and substrates on which they are deposited, band structures of nitrides, optical processes, deposition and fabric ation technologies (contacts), dopant incorporation and analyses, pn-j unctions, light-emitting diodes, and blue lasers are treated succinctl y. Attention is paid to both technological issues and fundamentals.

Table of Contents

Foreword. A View of the Past, and a Look into the Future by a Pioneer xv
Jacques I. Pankove
Introduction
1(7)
General Properties of Nitrides
8(37)
Crystal Structure of Nitrides
8(3)
Gallium Nitride
11(6)
Chemical Properties of GaN
13(1)
Thermal and Mechanical Properties of GaN
14(3)
Aluminum Nitride
17(6)
Thermal and Chemical Properties of AlN
17(2)
Mechanical Properties of AlN
19(1)
Electrical Properties of AlN
20(1)
Optical Properties of AlN
21(2)
Indium Nitride
23(3)
Crystal Structure of InN
24(1)
Mechanical and Thermal Properties of InN
25(1)
Electrical Properties of InN
25(1)
Optical Properties of InN
26(1)
Ternary and Quarternary Alloys
26(5)
AlGaN Alloy
27(2)
InGaN Alloy
29(2)
InAlN Alloy
31(1)
Substrates for Nitride Epitaxy
31(14)
Appendix: Fundamental Data for Nitride Systems
39(6)
Electronic Band Structure of Bulk and QW Nitrides
45(38)
Band-Structure Calculations
45(6)
Effect of Strain on the Band Structure of GaN
51(1)
k.p Theory and the Quasi-Cubic Model
52(2)
Quasi-Cubic Approximation
54(3)
Confined States
57(4)
Conduction Band
61(2)
Valence Band
63(3)
Exciton Binding Energy in Quantum Wells
66(2)
Polarization Effects
68(15)
Appendix
80(3)
Growth of Nitride Semiconductors
83(66)
Bulk Growth
84(3)
Substrates Used
87(2)
Conventional Substrates
88(1)
Compliant Substrates
88(1)
Van der Waals Substrates
89(1)
Substrate Preparation
89(5)
Substrate Temperature
94(1)
Epitaxial Relationship to Sapphire
95(3)
Growth by Hydride Vapor Phase Epitaxy (HVPE)
98(1)
Growth by OMPVE (MOCVD)
99(13)
Sources
100(2)
Buffer Layers
102(7)
Lateral Growth
109(3)
Growth on Spinel (MgAl2O4)
112(1)
Molecular Beam Epitaxy
112(15)
MBE Growth Systems
113(1)
Plasma-Enhanced MBE
114(3)
Reactive-Ion MBE
117(1)
Reactive MBE
118(7)
Modeling of the MBE-Like Growth
125(2)
Growth on 6H-SiC (0001)
127(2)
Growth on ZnO
129(7)
Growth on GaN
136(1)
Growth of p-Type GaN
137(2)
Growth of n-Type InN
139(1)
Growth of n-Type Ternary and Quaternary Alloys
139(1)
Growth of p-Type Ternary and Quarternary Alloys
140(1)
Critical Thickness
141(8)
Defects and Doping
149(42)
Dislocations
150(1)
Stacking-Fault Defects
151(2)
Point Defects and Autodoping
153(12)
Vacancies, Antisites and Interstitials
154(6)
Role of Impurities and Hydrogen
160(3)
Optical Signature of Defects in GaN
163(2)
Intentional Doping
165(21)
n-Type Doping with Silicon, Germanium and Selenium
165(2)
p-Type Doping
167(1)
Doping with Mg
168(11)
Optical Manifestation of Group-II Dopant-Induced Defects in GaN
179(3)
Doping with Beryllium
182(1)
Doping with Mercury
182(1)
Doping with Carbon
183(1)
Doping with Zinc
184(1)
Doping with Calcium
184(1)
Doping with Rare Earths
184(1)
Ion Implantation and Diffusion
185(1)
Defect Analysis by Deep-Level Transient Spectroscopy
186(4)
Summary
190(1)
Metal Contacts to GaN
191(25)
A Primer for Semiconductor-Metal Contacts
192(4)
Current Flow in Metal-Semiconductor Junctions
196(6)
The Regime Dominated by Thermionic Emission
197(1)
Thermionic Field-Emission Regime
198(1)
Direct Tunneling Regime
199(1)
Leakage Current
200(1)
The Case of a Forward-Biased p-n Junction
200(2)
Resistance of an Ohmic Contact
202(4)
Specific Contact Resistivity
203(1)
Semiconductor Resistance
204(2)
Determination of the Contact Resistivity
206(1)
Ohmic Contacts to GaN
207(6)
Non-Alloyed Ohmic Contacts
208(1)
Alloyed Ohmic Contacts
209(1)
Multi-Layer Ohmic Contacts
209(4)
Structural Analysis
213(2)
Observations
215(1)
Determination of Impurity and Carrier Concentrations
216(17)
Impurity Binding Energy
216(1)
Conductivity Type: Hot Probe and Hall Measurements
217(2)
Density of States and Carrier Concentration
219(4)
Electron and Hole Concentrations
223(1)
Temperature Dependence of the Hole Concentration
224(3)
Temperature Dependence of the Electron Concentration
227(2)
Multiple Occupancy of the Valence Bands
229(4)
Appendix: Fermi Integral
232(1)
Carrier Transport
233(34)
Ionized Impurity Scattering
235(1)
Polar-Optical Phonon Scattering
236(3)
Piezoelectric Scattering
239(1)
Acoustic Phonon Scattering
239(3)
Alloy Scattering
242(6)
The Hall Factor
248(1)
Other Methods Used for Calculating the Mobility in n-GaN
249(2)
Measured vis. a vis. Calculated Mobilities in GaN
251(6)
Transport in 2D n-Type GaN
257(1)
Transport in p-Type GaN and AlGaN
258(2)
Carrier Transport in InN
260(2)
Carrier Transport in AlN
262(4)
Transport in Unintensionally-Doped and High-Resistivity GaN
263(3)
Observation
266(1)
The p-n Junction
267(28)
Heterojunctions
267(1)
Band Discontinuities
268(7)
GaN/AlN Heterostructures
270(1)
GaN/InN and AlN/InN
271(4)
Electrostatic Characteristics of p-n Heterojunctions
275(3)
Current-Voltage Characteristics on p-n Junctions
278(10)
Generation-Recombination Current
279(3)
Surface Effects
282(2)
Diode Current Under Reverse Bias
284(1)
Effect of the Electric Field on the Generation Current
284(1)
Diffusion Current
285(2)
Diode Current Under Forward Bias
287(1)
Calculation and Experimental I-V Characteristics of GaN Based p-n Junctions
288(6)
Concluding Remarks
294(1)
Optical Processes in Nitride Semiconductors
295(45)
Absorption and Emission
296(4)
Band-to-Band Transitions
300(3)
Excitonuc Transitions
302(1)
Optical Transitions in GaN
303(28)
Excitonic Transitions in GaN
303(1)
Free Excitons
303(14)
Bound Excitons
317(1)
Exciton Recombination Dynamics
318(4)
High Injection Levels
322(1)
Free-to-Bound Transitions
322(1)
Donor-Acceptor Transitions
323(3)
Defect-Related Transitions
326(1)
Yellow Luminescence
326(3)
Group-II Element Related Transitions
329(2)
Optical Properties of Nitride Heterostructures
331(9)
GaN/AlGaN Heterostructures
332(4)
InGaN/GaN and InGaN/InGaN Heterostructures
336(4)
Light-Emitting Diodes
340(39)
Current-Conduction Mechanism in LED-Like Structures
341(3)
Optical Output Power
344(1)
Losses and Efficiency
345(5)
Visible-Light Emitting Diodes
350(2)
Nitride LED Performance
352(8)
On the Nature of Light Emission in Nitride-Based LEDs
360(10)
Pressure Dependence of Spectra
360(3)
Current and Temperature Dependence of Spectra
363(3)
I-V Characteristics of Nitride LEDs
366(4)
LED Degradation
370(3)
Luminescence Conversion and White-Light Generation With Nitride LEDs
373(3)
Organic LEDs
376(3)
Semiconductor Lasers
379(82)
A Primer to the Principles of Lasers
381(1)
Fundamentals of Semiconductor Lasers
382(7)
Waveguiding
389(16)
Analytical Solution to the Waveguide Problem
390(4)
Numerical Solution of the Waveguide Problem
394(8)
Far-Field Pattern
402(3)
Loss and Threshold
405(1)
Optical Gain
406(7)
Gain in Bulk Layers
407(3)
Gain in Quantum Wells
410(3)
Coulombic Effects
413(4)
Gain Calculations for GaN
417(22)
Optical Gain in Bulk GaN
418(1)
Gain in GaN Quantum Wells
419(1)
Gain Calculations in Wz GaN QW Without Strain
419(1)
Gain Calculations in WZ QW With Strain
420(3)
Gain in ZB QW Structures Without Strain
423(1)
Gain in ZB QW Structures with Strain
424(1)
Pathways Through Excitons and Localized States
425(6)
Measurement of Gain in Nitrides
431(1)
Gain Measurement via Optical Pumping
431(6)
Gain Measurement via Electrical Injection (Pump) and an Optical Probe
437(2)
Threshold Current
439(1)
Analysis of Injection Lasers with Simplifying Assumptions
440(2)
Recombination Lifetime
442(6)
Quantum Efficiency
448(2)
Gain Spectra of InGaN Injection Lasers
450(6)
Observations
456(1)
A Succinct Review of the Laser Evolution in Nitrides
457(4)
References 461(24)
Subject Index 485

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