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9780792385639

Optical Properties of Crystalline and Amorphous Semiconductors

by
  • ISBN13:

    9780792385639

  • ISBN10:

    0792385632

  • Format: Hardcover
  • Copyright: 1999-07-01
  • Publisher: Kluwer Academic Pub
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Summary

Optical Properties of Crystalline and Amorphous Semiconductors: Materials and Fundamental Principles presents an introduction to the fundamental optical properties of semiconductors. This book presents tutorial articles in the categories of materials and fundamental principles (Chapter 1), optical properties in the reststrahlen region (Chapter 2), those in the interband transition region (Chapters 3 and 4) and at or below the fundamental absorption edge (Chapter 5). Optical Properties of Crystalline and Amorphous Semiconductors: Materials and Fundamental Principles is presented in a form which could serve to teach the underlying concepts of semiconductor optical properties and their implementation. This book is an invaluable resource for device engineers, solid-state physicists, material scientists and students specializing in the fields of semiconductor physics and device engineering.

Table of Contents

Preface xi
Acknowledgments xiii
Contents of the Companion Book xv
Abbreviations and Acronyms xvii
Materials, Properties, and Basic Formulas
1(32)
Materials and Their Structures
1(6)
Crystalline Materials
1(1)
Diamond-, zinc-blende-, and wurtzite-type crystals
1(4)
Silicon carbide
5(1)
Rocksalt-type crystals
5(1)
Amorphous Materials
6(1)
Brillouin Zones and Electronic Energy-Band Structure
7(13)
Brillouin Zone
7(1)
Face-centered cubic lattice
7(1)
Hexagonal lattice
8(2)
Rhombohedral lattice
10(1)
Electronic Energy-Band Structure
10(1)
Diamond-type crystal: Si
10(3)
Zinc-blende-type crystal: GaAs
13(3)
Wurtzite-type crystal: CdS
16(4)
Optical Constants and Some Dispersion Relations
20(13)
Dielectric Constant: Tensor Representation
20(1)
Optical Dispersion Relations and Sum Rules
21(4)
Optical Spectrum and Its Classification into Several Regions
25(1)
Crystalline materials
25(3)
Amorphous materials
28(2)
References
30(3)
The Reststrahlen Region
33(30)
Static and High-Frequency Dielectric Constants
33(8)
General Consideration
33(5)
Alloys
38(1)
Temperature and Pressure Effects
38(3)
Reststrahlen Spectra
41(22)
Crystalline Materials
41(1)
Zinc-blende-type crystals
41(7)
Wurtzite-type crystals
48(1)
Alloys
48(8)
Temperature effect
56(1)
Amorphous Materials
56(5)
References
61(2)
The Interband Transition Region: Crystalline Materials
63(68)
Optical Dispersion Model
63(21)
Critical Points and Dispersion Theory
63(1)
Harmonic oscillator approximation
64(2)
Standard critical-point model
66(3)
Model dielectric function
69(3)
E0 and E0 + Δ0 transitions
72(2)
E1 and E1 + Δ1 transitions
74(3)
E0' and E2 transitions
77(2)
Indirect-band-gap transitions
79(2)
Plasma and d-Band Effects
81(3)
Temperature, Pressure, and Doping Effects
84(22)
Temperature Effect
84(11)
Pressure Effect
95(7)
Doping Effect
102(4)
Fresnel Reflection Coefficient, Ellipsometry Definition, and Surface Oxide Effect
106(14)
Fresnel Reflection Coefficient
106(1)
Isotropic medium
106(3)
Anisotropic medium
109(2)
Reflection at Multiple Interfaces
111(2)
Ellipsometry Definition and Optical Constants
113(1)
Effect of Surface Oxide
114(6)
Effect of Surface Roughness: Effective-Medium Approximation
120(11)
Effective-Medium Model
120(2)
Roughened Surface
122(4)
References
126(5)
The Interband Transition Region: Amorphous and Microcrystalline Materials
131(48)
Amorphous Materials
131(24)
Optical Band Gap
131(1)
Definition
131(5)
Temperature and pressure effects
136(1)
Temperature effect
136(2)
Pressure effect
138(2)
Optical Dispersion Model
140(1)
Density-of-states model
140(1)
Plasma-frequency (Campi-Coriasso) model
141(1)
Penn-gap (Forouhi-Bloomer) model
142(2)
Model dielectric function
144(10)
Temperature, Pressure, and Doping Effects on Optical Constants
154(1)
Microcrystalline Materials
155(24)
General Remarks
155(1)
Amorphization of Crystalline Si by Ion Implantation
156(1)
As-implanted samples
156(3)
Implanted and annealed samples
159(3)
Recrystallization of Amorphous Si by Thermal Annealing
162(1)
LRA--EMA analysis
162(6)
MDF analysis
168(7)
References
175(4)
At or Below the Fundamental Absorption Edge
179(72)
Optical Absorption
179(28)
One-Electron Approximation
179(1)
Direct-gap edge
179(2)
Indirect-gap edge
181(2)
Exciton Effect
183(1)
Direct exciton
183(9)
Indirect exciton
192(2)
Urbach Tail
194(1)
Temperature, Pressure, and Doping Effects
195(1)
Temperature effect
195(3)
Pressure effect
198(4)
Doping effect
202(4)
Amorphous Materials
206(1)
Refractive Index
207(25)
Theoretical Expression
207(1)
Sellmeier equation
207(1)
Ketteler--Helmholtz formula
208(1)
Single-oscillator model
208(1)
Modified single-oscillator model
208(1)
Pikhtin--Yas'kov formula
209(1)
Exponential band-edge model
209(1)
Simplified interband-transition model
210(1)
Quantum-density-matrix formulation
211(1)
Empirical Formula
211(2)
Experimental Data
213(1)
Comparison with calculated results
213(3)
Alloy-composition variation
216(2)
Temperature, pressure, and doping effects
218(1)
Temperature effect
218(7)
Pressure effect
225(2)
Doping effect
227(5)
Free-Carrier Absorption and Related Phenomena
232(19)
Free-Carrier Absorption
232(6)
Interband Absorption
238(1)
Interconduction-band absorption
238(4)
Intervalence-band absorption
242(4)
Carrier-Induced Change in Refractive Index
246(1)
References
247(4)
Concluding Remarks
251(6)
References
256(1)
Index 257

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