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Vladimir M. Kozenkov graduated from the Moscow Energetic Institute as a scientist in applied physical optics (laser department). For 30 years he worked at the Organic Intermediates and Dyes Institute (NIOPIK) in Moscow. He pioneered research and development of various organic photosensitive materials for holography, waveguide, integral and polarization optics, stereolithography, optical memory, imaging processing, and security applications. He was the first to discover the phenomenon of photoinduced birefringence in polyvinyl-cinnamate films in 1977. He has published more than 100 refereed papers and holds more than 50 patents.
Hoi-Sing Kwok obtained his PhD degree in applied physics from Harvard University in 1978. He joined the State University of New York at Buffalo in 1980 and became a full professor in 1985. He joined HKUST in 1992 an is currently Director of the Center for Display Research (www.cdr.ust.hk). Professor Kwok has written over 500 refereed publications and holds 40 patents in laser optics and LCD technologies. He is a Fellow of the OSA, the IEEE, and the SID.
About the Authors | p. xi |
Series Editor's Foreword | p. xiii |
Introduction | p. 1 |
References | p. 5 |
Mechanisms of LC Photoalignment | p. 7 |
Cis-Trans Isomerization | p. 9 |
'Command Surface' | p. 9 |
Cis-Trans Transformations in Azo-Dye Side-Chain Polymers and Azo-Dye in a Polymer Matrix | p. 10 |
Pure Reorientation of the Azo-Dye Chromophore Molecules or Azo-Dye Molecular Solvates | p. 13 |
Diffusion Model | p. 13 |
Polarized Absorption Spectra | p. 24 |
Modifications: Repeated Cis-Trans Photoisomerization Reaction Resulting in the Reorientation of the Backbone Structure | p. 25 |
Crosslinking in Cinnamoyl Side-Chain Polymers | p. 26 |
Photodegradation in Polyimide Materials | p. 28 |
Photoinduced Order in Langmuir-Blodgett Films | p. 33 |
References | p. 33 |
LC-Surface Interaction in a Photoaligned Cell | p. 39 |
Pretilt Angle Generation in Photoaligning Materials | p. 39 |
Generation of Large Pretilt Angles | p. 45 |
Generation of Large Pretilt Angles by Controlled Photodegradation | p. 45 |
Generation of Large Pretilt Angles by Nanostructured Surfaces | p. 47 |
Anchoring Energy in Photoaligning Materials | p. 51 |
Stability of Photoaligning Materials: Sensitivity to UV Light | p. 56 |
Comparison of the Characteristics of Photoalignment Layers for Different Mechanisms of LC Photoalignment | p. 59 |
Various Methods for the Experimental Characterization of Photoalignment Layers | p. 59 |
References | p. 64 |
Photoalignment of LCs | p. 69 |
Vertical LC Alignment | p. 69 |
Twisted LC Photoalignment | p. 72 |
Photoalignment of Ferroelectric LC | p. 74 |
Optical Rewritable LC Alignment | p. 78 |
Photoalignment with Asymmetric Surface Anchoring | p. 82 |
LC Photoalignment on Plastic Substrates | p. 83 |
Photoalignment on Grating Surface | p. 85 |
Photoalignment of Lyotropic and Discotic LCs | p. 90 |
Other Types of LC Photoalignment | p. 93 |
References | p. 96 |
Application of Photoalignment Materials in Optical Elements | p. 101 |
Polarizers | p. 101 |
Dichroism | p. 101 |
Direct Photoalignment | p. 104 |
Indirect Photoalignment | p. 107 |
Patterned Polarizers | p. 108 |
Retardation Films | p. 109 |
Types of Films | p. 109 |
Direct and Indirect Photoalignment | p. 111 |
Examples of Photoaligned Retardation Films | p. 113 |
Photo-patterned Phase Retarders and Color Filters | p. 118 |
Transflective LCD with Photo-patterned Polarizers and Phase Retarders | p. 123 |
Security Applications of Photoaligning and Photo-patterning | p. 129 |
Optical Elements Based on Photoaligning Technology | p. 131 |
References | p. 133 |
Novel LCDs Based on Photoalignment | p. 137 |
Bistable Nematic Displays | p. 137 |
Photoaligned Liquid-Crystal-on-Silicon Microdisplays | p. 140 |
Photoaligned Ferroelectric LCDs | p. 143 |
New Optical Rewritable Electronic Paper | p. 148 |
Application of Photoalignment in Photonic LC Devices | p. 151 |
References | p. 154 |
US Patents Related to Photoalignment of Liquid Crystals | p. 157 |
Introductory Remarks | p. 157 |
List of Patents: Patent Classification | p. 167 |
Analysis and Comments on the Patents | p. 218 |
Index | p. 221 |
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