Physics of Radio-Frequency Plasmas

by Pascal Chabert , Nicholas Braithwaite

• ISBN13: 9780521763004
• ISBN10: 0521763002
• Format: Hardcover
• Copyright: 2011-04-04
• Publisher: Cambridge University Press

Summary

Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.

Author Biography

Pascal Chabert is Research Director within CNRS. He currently leads the Low-Temperature Plasmas croup of the 'Laboratoire de Physique des Plasmas' at Ecole Polytechnique. His expertise is in plasma physics and plasma processing. Nicholas Braithwaite is Professor of Engineering Physics at The Open University, where his research group works on the physics of 'technological' plasmas. He has been on the editorial board of the journal Plasma Sources Science and Technology since 1998.

Table of Contents

Acknowledgements	p. vii
Introduction	p. 1
Plasmas	p. 1
Plasma processing for microelectronics	p. 3
Plasma propulsion	p. 9
Radio-frequency plasmas: E, H and W-modes	p. 14
What lies ahead	p. 17
Plasma dynamics and equilibrium	p. 18
The microscopic perspective	p. 19
The macroscopic perspective	p. 37
Global particle and energy balance	p. 41
The electrodynamic perspective	p. 45
Review of Chapter 2	p. 55
Bounded plasma	p. 59
The space charge sheath region	p. 61
The plasma/sheath transition	p. 72
The plasma region: transport models	p. 78
Review of Chapter 3	p. 90
Radio-frequency sheaths	p. 96
Response times	p. 97
Ion dynamics	p. 102
Electron dynamics	p. 110
Analytical models of (high-frequency) RF sheaths	p. 116
Summary of important results	p. 130
Single-frequency capacitively coupled plasmas	p. 131
A constant ion density, current-driven symmetrical model	p. 133
A non-uniform ion density, current-driven model	p. 146
Global model	p. 154
Other regimes and configurations	p. 165
Summary of important results	p. 174
Multi-frequency capacitively coupled plasmas	p. 176
Dual-frequency CCP in the electrostatic approximation	p. 177
Electromagnetic regime at high frequency	p. 187
Summary of important results	p. 218
Inductively coupled plasmas	p. 219
Electromagnetic model	p. 222
Impedance of the plasma alone	p. 233
The transformer model	p. 236
Power transfer efficiency in pure inductive discharges	p. 241
Capacitive coupling	p. 243
Global model	p. 246
Summary of important results	p. 252
Further considerations	p. 253
Helicon plasmas	p. 260
Parallel propagation in an infinite plasma	p. 264
Helicon wave propagation in a cylinder	p. 268
Conditions for existence of the helicon modes	p. 276
Wave power absorption: heating	p. 277
E-H-W transitions	p. 283
Summary of important results	p. 286
Real plasmas	p. 287
High-density plasmas	p. 288
Magnetized plasmas	p. 293
Electronegative plasmas	p. 298
Expanding plasmas	p. 313
Electrical measurements	p. 318
Electrostatic probes	p. 319
Electrostatic probes for RF plasmas	p. 340
A retarding field analyser (RFA)	p. 348
Probing with resonances and waves	p. 354
Summary of important results	p. 365
Appendix: Solutions to exercises	p. 368
References	p. 375
Index	p. 383
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