9780841238572

Polymers for Microelectronics and Nanoelectronics

by ; ;
  • ISBN13:

    9780841238572

  • ISBN10:

    084123857X

  • Format: Hardcover
  • Copyright: 2004-04-01
  • Publisher: American Chemical Society

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Summary

Discusses patterning, insulating, and packaging polymeric materials for the $150-billion microelectronics industry as well as the rapidly emerging nanoelectronics and organic electronics industries. Chapters discuss patterning, insulating, and packaging polymeric materials as well as organic materials for nanoelectronics, organic electronics, and optoelectronics. This book covers the synthesis, characterization, structure-property relationship, performance, and applications of these materials.

Table of Contents

Preface xi
1. Recent Progress in Materials for Organic Electronics
1(14)
Zhenan Bao
2. PPV Nanotubes, Nanorods, and Nanofilms as well as Carbonized Objects Derived Therefrom
15(15)
Kyungkon Kim, Guolun Zhong, Jung-Il Jin, Jung Ho Park, Seoung Hyun Lee, Dong Woo Kim, Yung Woo Park, and Whikun Yi
3. Layer-by-Layer Assembly of Molecular Materials for Electrooptical Applications
30(14)
M.E. van der Boom and T.J. Marks
4. Oxidative Solid-State Cross-Linking of Polymer Precursors to Pattern Intrinsically Conducting Polymers
44(10)
Sung-Yeon Jang, Manuel Marquez, and Gregory A. Sotzing
5. Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography
54(18)
T.H. Fedynyshyn, W.A. Mowers, R.R. Kunz, R.F. Sinta, M. Sworin, A. Cabral, and J. Curtin
6. 157-nm Resist Materials Using Main-Chain Fluorinated Polymers
72(14)
Toshiro Itani, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Naomi Shida, and Minoru Toriumi
7. Correlation of the Reaction Front with Roughness in Chemically Amplified Photoresists
86(12)
Ronald L. Jones, Vivek M. Prabhu, Dario L. Goldfarb, Eric K. Lin, Christopher L. Soles, Joseph L. Lenhart, Wen-li Wu, and Marie Angelopoulos
8. Utilizing Near Edge X-ray Absorption Fine Structure to Probe Interfacial Issues in Photolithography
98(20)
Joseph L. Lenhart, Daniel A. Fischer, Sharadha Sambasivan, Eric K. Lin, Christopher L. Soles, Ronald L. Jones, Wen-li Wu, Dario L. Goldfarb, and Marie Angelopoulos
9. Photolabile Ultrathin Polymer Films for Spatially Defined Attachment of Nano Elements
118(11)
B. Voit, F. Braun, Ch. Loppacher, S. Trogisch, L.M. Eng, R. Seidel, A. Gorbunoff, W. Pompe, and M. Mertig
10. Soft Lithography on Block Copolymer Films: Generating Functionalized Patterns on Block Copolymer Films as a Basis to Further Surface Modification 129(15)
Martin Brehmer, Lars Conrad, Lutz Funk, Dirk Allard, Patrick Theato, and Anke Helfer
11. Nanoporous, Low-Dielectric Constant Organosilicate Materials Derived from Inorganic Polymer Blends 144(17)
R.D. Miller, W. Volksen, V.Y. Lee, E. Connor, T. Magbitang, R. Zafran, L. Sundberg, C.J. Hawker, J.L. Hedrick, E. Huang, M. Toney, Q.R. Huang, C.W. Frank, and H.-C. Kim
12. Porous Low-k Dielectrics: Material Properties 161(12)
C. Tyberg, E. Huang, J. Hedrick, E. Simonyi, S. Gates, S. Cohen K. Malone, H. Wickland, M. Sankarapandian, M. Toney, H.-C. Kim, R. Miller, W. Volksen, P. Rice, and L. Lurio
13. Ultra Low-k Dielectric Films with Ultra Small Pores Using Poragens Chemically Bonded to Siloxane Resin 173(14)
Bianxiao Zhong and Eric S. Moyer
14. Design of Nanoporous Polyarylene Polymers for Use as Low-k Dielectrics in Microelectronic Devices 187(12)
H. Craig Silvis, Kevin J. Bouck, James P. Godschalx, Q. Jason Niu, Michael J. Radler, Ted M. Stokich, John W. Lyons, Brandon J. Kern, Joan G. Marshall, Karin Syverud, and Mary Leff
15. Molecular Brushes as Templating Agents for Nanoporous SiLK* Dielectric Films 199(10)
Q. Jason Niu, Steven J. Martin, James P. Godschalx, and Paul H. Townsend
16. X-ray Reflectivity as a Metrology to Characterize Pores in Low-k Dielectric Films 209(14)
Christopher L. Soles, Hae-Jeong Lee, Ronald C. Hedden, Da-wei Liu, Barry J. Bauer, and Wen-li Wu
17. Micro- and Nanoporous Materials Developed Using Supercritical CO2: Novel Synthetic Methods for the Development of Micro- and Nanoporous Materials Toward Microelectronic Applications 223(13)
Sara N. Paisner and Joseph M. DeSimone
18. Thermally Degradable Photocross-Linking Polymers 236(15)
Masamitsu Shirai, Satoshi Morishita, Akiya Kawaue, Haruyuki Okamura, and Masahiro Tsunooka
19. Evaluation of Infrared Spectroscopic Techniques to Assess Molecular Interactions 251(13)
Robert K. Oldak and Raymond A. Pearson
20. Study on Metal Chelates as Catalysts of Epoxy and Anhydride Cure Reactions for No-Flow Underfill Applications 264(15)
Zhuqing Zhang and C.P. Wong
21. Benzocyclobutene-Based Polymers for Microelectronic Applications 279(15)
Ying-Hung So, Phil E. Garrou, Jang-Hi Im, and Karou Ohba
22. Formation of Nanocomposites by In Situ Intercalative Polymerization of 2-Ethynylpyrdine in Layered Aluminosilicates: A Solid-State NMR Study 294(15)
A.L. Cholli, S.K. Sahoo, D.W. Kim, J. Kumar, and A. Blumstein
Indexes
Author Index
309(2)
Subject Index
311

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