In Situ Process Diagnostics and Modelling

by Auciello, Orlando; Krauss, Alan Robert; Irene, Eugene A.; Schultz, J. A.

• ISBN13: 9781558994768
• ISBN10: 1558994769
• Format: Hardcover
• Copyright: 1999-09-01
• Publisher: Materials Research Society

Summary

Fabrication of future generations of advanced film-based devices will require monitoring of ultrathin layers with sharp interfaces in which the layer thickness may reach atomic dimensions. It therefore becomes increasingly more important to be able to monitor film-deposition processes in situ and in real time under different background pressure conditions. Diffusion or surface segregation processes relevant to device fabrication also need to be characterized. To these ends, a variety of complimentary in situ, real-time characterization techniques are needed to advance the science and technology of thin films and interfaces. This book offers an interdisciplinary exchange of ideas from researchers with cross-disciplinary expertise. The application of in situ characterization methods are discussed in relation to different materials including oxides, nitrides, semiconductors, and metals analyzed at the macroscopic, microscopic and nanoscale level.

Table of Contents

Preface
Acknowledgments
In Situ Real-Time Studies of Film Growth Processes Using Ion Scattering and Direct Recoil Spectroscopy Techniques	p. 3
Combined Spectroscopic Ellipsometry and Ion Beam Surface Analysis for In Situ, Real-Time Characterization of Complex Oxide Film Growth	p. 15
In Situ Real-Time Depth Profiling by Elastic Recoil Detection and Its Application to Ion Nitriding of Stainless Steel	p. 21
In Situ Etch Rate Measurements by Alpha-Particle Energy Loss	p. 29
In Situ Growth Studies of Artificial Layered (Ba,Sr,Ca)CuO[subscript 2] on Quasi-Ideal SrTiO[subscript 3] Substrates by High Pressure RHEED	p. 35
Real-Time Characterization of Non-Ideal Surfaces and Thin-Film Growth by Advanced Ellipsometric Spectroscopies	p. 43
Modelling and Real-Time Process Monitoring of Organometallic Chemical Vapor Deposition of III-V Phosphides and Nitrides at Low and High Pressures	p. 59
Extension of Multichannel Spectroscopic Ellipsometry into the Ultraviolet for Real-Time Characterization of the Growth of Wide-Bandgap Materials From 1.5 to 6.5 eV	p. 71
In Situ Real-Time Ellipsometry Study of Dynamic Processes of YBa[subscript 2]Cu[subscript 3]O[subscript 7-x] Thin Films	p. 77
Real-Time Spectroscopic Ellipsometry Study of the Thermal Cleaning Process for Silicon Epitaxial Growth by UHV-CVD	p. 83
In Situ Spectroscopic Ellipsometry and Optical Emission Studies of CF[subscript 4]/O[subscript 2] Plasma Etching of Silicon Nitride	p. 89
In Situ Spectroscopic Ellipsometry Studies of the Interaction Process of Ethene With Si Surfaces During SIC Formation	p. 95
In Situ Observation of UV/Ozone Oxidation of Silicon Using Spectroscopic Ellipsometry	p. 101
Real-Time Monitoring by Spectroscopic Ellipsometry and Desorption Mass Spectroscopy During Molecular Beam Epitaxy of AlGaAs/GaAs at High Substrate Temperatures	p. 107
In Situ Optical Characterization of Titanium Nitride Thin Films for Applications in Microelectronics	p. 113
In Situ Real-Time Studies of Nickel Silicide Formation	p. 121
Manufacturable Large Area CdS Thin Films for Solar Cell Applications Monitored With Optical Emission Spectroscopy	p. 127
In Situ High Temperature Optical Microscopic Observations of Crystallization Mechanism in NdBa[subscript 2]Cu[subscript 3]O[subscript x]	p. 133
Micromechanical Thin-Film Characterization	p. 139
Modelling the Evolution of Ellipsometric Data During the Thermally Induced Pt-Silicide Formation: Activation Energies and Prefactors	p. 145
Real-Time X-ray Scattering Study of Sputter-Deposited LaNiO[subscript 3] Thin Films on Si Substrates	p. 153
Modelling and Validation of Sensor and Actuator Dynamics for, and Real-Time Feedback Control of, Thermal Chlorine Etching of Gallium Arsenide	p. 159
In Situ Design of Experiments for a Reactive Ion Etching Process	p. 165
Remote True Temperature Pyrometry of Si Wafers: Theoretical and Practical Considerations	p. 171
In Situ Diagnostics of Methane/Hydrogen Plasma Interactions With Si(100)	p. 179
Study of Natural Oxidation of Ultra-Thin Aluminum Layers With In Situ Resistance Measurement	p. 185
In Situ Spectroscopy of Ion-Induced Photon Emission During Metal Nanoparticle Formation in Silica Glass With High-Flux Cu[superscript -] Implantation	p. 191
Author Index	p. 197
Subject Index	p. 199
Table of Contents provided by Blackwell. All Rights Reserved.