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Sputtering Materials for VLSI and Thin Film Devices,9780815515937
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Sputtering Materials for VLSI and Thin Film Devices



Pub. Date:
Elsevier Science Ltd

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This is the edition with a publication date of 10/25/2013.
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An important resource for the microelectronics and flat panel display industries, this book focuses on the development of sputtering targets for conductor, diffusion barrier, reflective, data storage and display applications.Sarkar reviews essential microelectronics industry topics, including: history and technology trends; chip making fundamentals; deposition and properties of thin films; and the role of sputtering target performance on overall production yield. Materials science fundamentals, types of metallic materials for conductors, diffusion barrier, data storage, and flat panel display applications are also discussed.The author illustrates his arguments with case studies and real-world examples of troubleshooting in an industrial setting.* Provides practical case studies and troubleshooting examples* Unique coverage of the design of sputtering targets and processing of sputtering materials for thin film applications* Essential design information for engineers working in the field of flat panel displays

Table of Contents

Sputtering materials for microelectronic industry
Sputter deposition of thin films
Performance of sputtering targets and productivity
Sputtering target manufacturing
Sputtering targets for integrated circuits
Sputtering targets for displays and photovoltaic devices
Ferromagnetic sputtering targets for silicide and data storage applications
Diffusion and phase transformation
Crystallographic texture
Phase change materials
Mechanical property evaluation
Units and conversion factors
Periodic table
Table of Contents provided by Publisher. All Rights Reserved.

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