Unconventional Nanopatterning Techniques and Applications

by Rogers, John A.; Lee, Hong H.

• ISBN13: 9780470099575
• ISBN10: 0470099577
• Edition: 1st
• Format: Hardcover
• Copyright: 2008-11-10
• Publisher: Wiley

Summary

Patterning or lithography is at the core of modern science and technology and cuts across all disciplines. With the emergence of nanotechnology, conventional methods based on electron beam lithography and extreme ultraviolet photolithography have become prohibitively expensive. As a result, a number of simple and unconventional methods have been introduced, beginning first with research demonstrations in the mid 1990s. This book focuses on these unconventional patterning techniques and their applications to optics, organic devices, electronic devices, biological devices, and fluidics.

Author Biography

John A. Rogers, PhD, holds the Lee J. Flory-Founder Chair in the College of Engineering at the University of Illinois at Urbana-Champaign. He was selected as one of the Top 50 Research Leaders by Scientific American. Dr. Rogers has authored more than 200 papers and holds nearly sixty patents.

Hong H. Lee, PhD, is a Professor in the School of Chemical and Biological Engineering at the Seoul National University, Korea. He is the author of more than 200 papers and two books.

Table of Contents

Preface

Nanopatterning Techniques

Introduction

Materials

Introduction

Mold materials and Mold Preparation

Surface Treatment and Modification

References

Patterning Based on Natural Force

Introduction

Capillary Force

London Force and Liquid Filament Stability

Mechanical Stress: Patterning of A Metal Surface

References

Patterning Based on Work of Adhesion

Introduction

Work of Adhesion

Kinetic Effects

Transfer Patterning

Subtrative Transfer Patterning

Transfer Printing

References

Patterning Based on Light: Optical Soft Lithography

Introduction

System Elements

Two-Dimensional Optical Soft Lithography (OSL)

Three-Dimensional Optical Soft Lithography

Applications

References

Patterning Based on External Force: Nanoimprint Lithography

Introduction

NIL MOLD

NIL Resist

The Nanoimprint Process

Variations of NIL Processes

Conclusion

References

Patterning Based on Edge Effects: Edge Lithography

Introductory

Topography-Directed pattern Transfer

Exposure of Nanoscale Edges

Conclusion and Outlook

References

Patterning with Electrolyte: Solid-State Superionic Stamping

Introduction

Solid-State Superionic Stamping

Process Technology

Process Capabilities

Examples of Electrochemically Imprinted Nanostructures Using the S4 Process

Acknowledgments

References

Patterning with Gels: Lattice-Gas Models

Introduction

The RDF Method

Microlenses: Fabrication

Microlenses: Modeling Aspects

RDF at the Nanoscale

Summary and Outlook

References

Patterning with Block Copolymers

Introduction

Orientation

Long-Range

Nanoporous BCP Films

References

Perspective on Applications. II. Applications

Soft Lithography for Microfluidic Microelectromechanical Systems (MEMS) and Optical Devices

Introduction

Microfluidic Devices for Concentration Gradients

Electrochemistry and Microfluidics

PDMS and Electrochemistry

Optics and Microfluidics

Unconventional Soft Lithographic Fabrication of Optical Sensors

Acknowledgements

References

Unconventional patterning Methods for BioNEMS

Introduction

Fabrication of Nanofluidic System for Biological Applications

Fabrication of Biomolecular Nanoarrays for Biological Applications

Fabrication of Nanoscale Topographies for Tissue Engineering Applications

References

Micro Total Analysis System

Introduction

Fundamentals of Microchip Chemistry

Key Technologies

Applications

References

Combinations of Top-Down and Bottom-Up Nanofabrication Techniques and Their Application to Create Functional Devices

Introduction

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