Dusty Plasmas Physics, Chemistry and Technological Impacts in Plasma Processing Edited by André Bouchoule Université d'Orléans, France Dusty Plasmas gives the reader a thorough overview of current knowledge on many aspects of the subject, from the basic science to technological implications. The basic physics and chemistry of dusty plasmas developed in the first two chapters are complemented by the more practical considerations of diagnostics and technological implications in the two final chapters. The book will be of interest to those already involved in or just discovering dusty plasmas in their research and/or industrial activity. * Physics and Modelling of Dusty Plasmas * Sources and Growth of Particles * Diagnostics of a Dusty Plasma * Technological Impacts of Dusty Plasmas

André Bouchoule is the author of Dusty Plasmas: Physics, Chemistry, and Technological Impact in Plasma Processing, published by Wiley.

List of Contributors

ix

Physics and Modelling of Dusty Plasmas

1

(76)

J.-P. Boeuf

C. Punset

Basic Phenomena Associated with the Presence of Dust Particles in a Laboratory Plasma

2

(25)

Charge and Floating Potential of an Isolated Dust Particle

2

(17)

Particle Temperature in a Low-Pressure Non-equilibrium Plasma

19

(2)

Charge Fluctuations

21

(4)

Charging Time

25

(2)

Forces Acting on Dust Particles

27

(12)

Electric Force

27

(3)

Ion Drag

30

(5)

Neutral Drag

35

(2)

Thermophoresis

37

(1)

Gravity

38

(1)

Order of Magnitude of the Different Forces and Conclusion

38

(1)

Particle Transport and Trapping in Plasma Reactors

39

(10)

Maxima of Plasma Potential in a Capacitively Coupled R.F. Reactor

40

(5)

Trapping of Dust Particles in a Capacitively Coupled R.F. Reactor

45

(4)

High-Density Reactors

49

(1)

Non-isolated Particles

49

(28)

Charge and Floating Potential

50

(3)

Potential of a Dust Cloud

53

(1)

Maintenance of a Dusty Laboratory Plasma

54

(11)

Power Deposition in Pristine and Dusty Plasmas

65

(1)

Phase Transitions

66

(6)

References

72

(5)

Sources and Growth of Particles

77

(104)

Jerome Perrin

Introduction: A Four-Step Scenario of Particle Growth

77

(2)

Experimental Conditions and Phenomenology of Particle Formation

79

(6)

Thermal Plasmas: Arcs and Flames

79

(1)

Glow Discharge Chemical Vapour Deposition and Plasma Polymerization

80

(3)

Sputtering and Reactive Ion Etching

83

(1)

Other Sources of Particles

84

(1)

Physical Properties of Clusters and Small Particles in a Plasma

85

(33)

Cluster Conservation Equations

85

(3)

Electronic and Thermodynamic Properties

88

(10)

Collisions and Reactions between Clusters

98

(7)

Transport of Clusters in a Plasma

105

(2)

Electron Collisions on Clusters

107

(11)

Basic Models of Nucleation and Cluster Growth

118

(18)

Definitions

118

(1)

Nucleation Controlled by Condensation -- Evaporation

119

(7)

Kinetic Modelling of Nucleation and Cluster Growth

126

(5)

Anion-Induced Nucleation in Low-Pressure Glow Discharges

131

(5)

Nucleation Routes in Silane Discharges

136

(17)

Plasma Chemistry of Radicals, Cations and Anions in SiH4 Discharges

136

(7)

Anion-Induced Nucleation Assisted by Vibrational Excitation of SiH4

143

(2)

Homogeneous Nucleation Driven by Short-Lifetime Radicals

145

(5)

Discussion

150

(3)

Particle Coagulation and Growth of Macroscopic Particles

153

(14)

Coagulation Equation

153

(4)

Mechanisms and Models of Coagulation and Chain Agglomeration

157

(5)

Correlation between Particle Coagulation and Transition of Discharge Regimes

162

(3)

Particle Growth and Behaviour after Coagulation

165

(1)

Analogy with Colloids

166

(1)

Conclusion

167

(14)

Acknowledgements

169

(1)

References

169

(12)

Diagnostics of a Dusty Plasma

181

(124)

L. Boufendi

W. Stoffels

E. Stoffels

Introduction

181

(4)

In Situ Particle Detection and Sizing

185

(46)

Introduction

185

(2)

Lorentz--Mie Scattering Theory

187

(13)

In situ Particle Detection

200

(16)

In situ Particle Sizing

216

(15)

Morphological, Structural and Chemical Characterization

231

(13)

Electron Microscopy

232

(7)

Infrared Spectroscopy of Dusty Plasmas

239

(4)

Raman Spectroscopy

243

(1)

Plasma Diagnostics

244

(61)

Plasma and Discharge Diagnostics Useful in Dusty Conditions

245

(4)

Probes in Dusty Plasmas

249

(9)

Mass Spectrometry

258

(10)

Microwave Diagnostics

268

(7)

Laser-Induced Photodetachment

275

(13)

Dynamic Particle Charge Measurements

288

(3)

Temperature Measurements of Dust Grains

291

(5)

References

296

(9)

Technological Impacts of Dusty Plasmas

305

(92)

Andre Bouchoule

Introduction

305

(2)

Dust Particle Dynamics and Surface Contamination

307

(35)

Trapping Effects During the Plasma Process

307

(11)

Particle Contamination during Plasma `off' Sequences

318

(9)

Plasma Reactor Surface as the Particle Source

327

(6)

Towards Particle-Free Surface Processing

333

(9)

Dust-Free Processing in PECVD Technology

342

(23)

Conditions for Dust Formation in Low-Pressure PECVD

343

(3)

Powder Formation in Silane Plasma Chemistry

346

(8)

Indications on Particle Appearance in Other Plasma Chemistries

354

(1)

Dust-Free PECVD Processing Methods

355

(7)

Cleaning Problems in PECVD Technology

362

(3)

Applications of Low-Pressure Dusty Plasmas

365

(32)

Applications of the Energetics of Dusty Plasmas

366

(8)

Applications Derived from Particle Size Control

374

(7)

Using the Trapping Effect for Particle Processing

381

(7)

References

388

(9)

Author Index

397

(8)

Subject Index

405

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Dusty Plasmas Physics, Chemistry, and Technological Impact in Plasma Processing

9780471973867

0471973866

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