Chemical Vapor Deposition Polymerization

by Fortin, Jeffrey B.; Lu, Toh-Ming

• ISBN13: 9781402076886
• ISBN10: 1402076886
• Format: Hardcover
• Copyright: 2003-11-01
• Publisher: Kluwer Academic Pub

Summary

Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.

Table of Contents

List of Figures	ix
List of Tables	xiii
Preface	xv
Acknowledgments	xvii
1. INTRODUCTION	1	(8)
1 Polymers and Their Applications	1	(1)
2 Polymerization Mechanisms	2	(1)
3 Polymerization Techniques	2	(2)
4 Parylene Family Polymers	4	(5)
4.1 Parylene History and the Gorham Method	4	(1)
4.2 Types of Parylene and Applications	4	(5)
2. DEPOSITION EQUIPMENT	9	(14)
1 Deposition System Design	9	(2)
2 Vacuum Systems	11	(1)
3 Pressure Measurement	11	(1)
4 Pump Speed, Flow Rate, and Contact Time	11	(4)
4.1 Determining the pumping speed and flow rate	12	(2)
4.2 Calculating the residence time	14	(1)
5 Mass Spectrometry for in-situ Chemical Analysis and Process Monitoring/Control	15	(1)
6 Substrate Holders and Temperature Control	16	(1)
7 System-to-System Variations	17	(1)
8 Example Deposition System	18	(3)
9 Commercially Available Deposition Systems and Coating Services	21	(2)
3. STEP-BY-STEP GUIDE TO DEPOSITING PARYLENE	23	(4)
1 Equipment Preparation	23	(1)
2 Substrate and Source Preparation	23	(1)
3 Depositing a Film	24	(1)
4 Some Considerations	25	(2)
4. PARYLENE-N PRECURSOR CHEMISTRY	27	(14)
1 Dimer	27	(6)
1.1 Thermodynamics	28	(1)
1.2 Dimer purity	29	(4)
1.3 Mass Spectrometer Fragmentation Pattern	33	(1)
2 Monomer	33	(4)
2.1 Thermodynamics	34	(2)
2.2 Mass Spectrometer Fragmentation Patterns	36	(1)
3 Dimer-to-Monomer Conversion	37	(4)
5. DEPOSITION KINETICS FOR POLYMERIZATION VIA THE GORHAM ROUTE	41	(16)
1 Introduction	41	(1)
2 Overview of CVD Kinetics	41	(1)
3 Identifying the Control Type	42	(1)
4 Identifying the Control hype for Parylene CVD	43	(3)
4.1 The Effect of Temperature on Deposition Rate	44	(1)
4.2 The Effect of Pressure on Deposition Rate	45	(1)
4.3 Summary	45	(1)
5 Kinetic Modeling of Parylene Thin Film Growth	46	(9)
5.1 Introduction	46	(2)
5.2 The Chemisorption Model	48	(7)
6 Conclusion	55	(2)
6. FILM PROPERTIES	57	(26)
1 Overview	57	(1)
2 Adhesion	57	(3)
3 Cystallinity	60	(1)
4 Thermal Stability	61	(1)
5 Chemical Properties and Biocompatibility	62	(1)
6 Properties and Measurement Techniques for Parylene-N Films	63	(14)
6.1 Electrical Properties	63	(1)
6.2 Mechanical Properties	64	(1)
6.3 Optical Properties	65	(1)
6.4 Surface Morphology	66	(4)
6.5 Thermal Stability of Parylene-N	70	(6)
6.6 Summary	76	(1)
7 UV Degradation	77	(6)
7 OTHER CVD POLYMERS	83
1 Introduction	83	(1)
2 Polyrlaphthalene	83	(5)
2.1 Film deposition	83	(4)
2.2 Polynaphthalene Film Properties	87	(1)
3 Polyimides	88	(1)
4 Polytetrafluoroethylene Family	89