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9780195320176

Fabrication Engineering at the Micro and Nanoscale

by
  • ISBN13:

    9780195320176

  • ISBN10:

    0195320174

  • Edition: 3rd
  • Format: Paperback
  • Copyright: 2007-09-17
  • Publisher: Oxford University Press
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Summary

Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, the third edition of Fabrication Engineering at the Micro and Nanoscale provides a thorough and accessible introduction to all fields of micro and nano fabrication. Completely revised and updated, the text covers the entire basic unit processes used to fabricate integrated circuits and other devices. It includes more worked examples, illustrations, and expands coverage of the frontiers of fabrication processes. The physics and chemistry of each process are introduced along with descriptions of the equipment used to carry out the processes. The text uses a popular commercial process simulation suite--the Silvaco AthenaRG set of codes--to provide meaningful examples of many of the basic processes including diffusion, oxidation, lithography, and deposition. The book goes on to discuss the integration of these basic unit processes into various technologies, concentrating on CMOS transistors. The text breaks down the material into treatments on the concepts of process modules, thermal budget, advanced architectures, and the use of channel strain for improved performance.

Author Biography


Stephen A. Campbell is Professor of Electrical and Computer Engineering at the University of Minnesota, Distinguished Professor of the Institute of Technology, Director of the Nanofabrication Center, and Director of the Center for Nanostructure Applications. He has extensive experience in both academia and industry in microelectronic processing. His current research interests include the application of semiconductor nanoparticles for high performance electronic and optoelectronic devices, advanced materials, novel sensors and transistor structures, and various applications of MEMS.

Table of Contents

An Introduction to Microelectronic Fabrication
Semiconductor Substrates
Diffusion
Thermal Oxidation
Ion Implantation
Rapid Thermal Processing
Optical Lithography
Photoresists
Nonoptical Lithographic Techniques
Vacuum Science and Plasmas
Etching
Physical Deposition: Evaporation and Sputtering
Chemical Vapor Deposition
Epitaxial Growth
Device Isolation, Contacts, and Metallization
CMOS Technologies
Other Transistor Technologies
Optoelectronic Technologies
Mems
Integrated Circuit Manufacturing
Appendixes
Acronyms and Common Symbols
Properties of Selected Semiconductor Materials
Physical Constants
Conversion Factors
Some properties of the Error Function
F Values
Index
Table of Contents provided by Publisher. All Rights Reserved.

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