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Molecule and cluster bombardment: energy loss, trajectories, and collision cascades | p. 1 |
Nonlinear transmission sputtering | p. 12 |
Molecular dynamics study of shock wave generation by cluster impact on solid targets | p. 16 |
Track formation in metals by electronic processes using atomic and cluster ions | p. 23 |
Atomic and cluster ion bombardment in the electronic stopping power regime: A thermal spike description | p. 26 |
Production, acceleration and diagnostics of high intensity beams | p. 30 |
Production, acceleration and diagnostics of molecular ions and ionized clusters | p. 39 |
Hyperthermal chemistry and cluster collisions | p. 48 |
A plasma desorption mass spectrometry study of cluster ion information from group IIA nitrates | p. 55 |
Sputtering of large size clusters from solids bombarded by high energy cluster ions and fullerenes | p. 59 |
Acceleration of clusters, collision induced charge exchange at MeV energies and applications for materials science | p. 64 |
The use of coincidence counting mass spectrometry to study the emission and metastable dissociation of cluster ions | p. 68 |
Secondary electron emission of solids by impact of molecular ions and clusters | p. 72 |
Secondary electron emission from thin carbon foils under hydrogen cluster impact | p. 79 |
SiO[subscript 2] film formation at room temperature by gas cluster ion beam oxidation | p. 83 |
Reactive accelerated cluster erosion (RACE) by ionized cluster beams | p. 86 |
Investigation of damage formation by gas cluster ion bombardment | p. 89 |
Preparation of C60 single crystalline thin film by ionized cluster beam deposition and ion implantation into single crystalline C60 thin film | p. 94 |
The computer simulation of energetic particle-solid interactions | p. 99 |
STM investigation of energetic carbon cluster ion penetration depth into HOPG | p. 105 |
Atomistic study of defect generation mechanisms in Mo/W superlattices | p. 109 |
Defect creation induced by GeV ions in MgO containing Na precipitates | p. 112 |
N[superscript +] ion implantation effects on microhardness and adhesion in TiO[subscript 2] films | p. 116 |
Conducting polymer synthesis via ion beam induced precursor conversion | p. 120 |
Processing and characterization of ferroelectric thin films by multi-ion-beam sputtering | p. 125 |
TED of boron in the presence of EOR defects: the use of the theory of Ostwald ripening to calculate Si-interstitial supersaturation in the vicinity of extrinsic defects | p. 129 |
Observation of vacancy clustering in FZ-Si crystals during in situ electron irradiation in a high voltage electron microscope | p. 133 |
The damage recovery and electrical activation of shallow boron implants in silicon: The effects of high energy implants | p. 139 |
The effect of dose rate on ion implanted impurity profiles in silicon | p. 144 |
Damage profiles in as-implanted silicon: fluence dependence | p. 148 |
Dynamic Monte Carlo simulation of nonlinear damage growth during ion implantation of crystalline silicon | p. 152 |
Molecular dynamics study of the fluence dependence of Si sputtering by 1 keV Ar[superscript +] ions | p. 156 |
Spectroscopic ellipsometry applied to the determination of an ion implantation depth profile | p. 160 |
Kinetics of impurity gettering on buried defects created by MeV argon implantation | p. 169 |
Influence of sample thickness on carrier lifetime modification induced by 4 MeV proton implantation in silicon | p. 173 |
Ultra-shallow junction formation in silicon using ion implantation | p. 177 |
The chemical factor and its influence on the formation of defect structures and their gettering properties in layers of silicon implanted with chemical-active ions | p. 184 |
Implanted buried layers and interfaces: Application in the new area of very- and ultra-high efficiency solar cells | p. 188 |
Ion implanted silicides studies by frequency noise level measurements | p. 192 |
The effect of rapid thermal treatments on the formation of shallow junctions by implanting boron and [actual symbol not reproducible] ions into (100) silicon through a protecting mask | p. 196 |
Submicron CoSi[subscript 2] structures fabricated by focused ion beam implantation and local flash lamp melting | p. 201 |
Structural defects in SIMOX | p. 206 |
Novel approach for synthesizing of nanometer-sized Si crystals in SiO[subscript 2] by ion implantation and their optical characterization | p. 214 |
Effect of the gas ambient on the intensity of the visible photoluminescence from Si microcrystallites in a SiO[subscript 2] matrix formed by ion implantation | p. 219 |
Self-structuring of buried SiO[subscript 2] precipitate layers during IBS: A computer simulation | p. 223 |
Improved characterization of fully-depleted SOI wafers by pseudo-MOS transistor | p. 228 |
Progress in Japanese frontier projects on ion beam processing of advanced materials | p. 233 |
Characteristics and peculiarities of surface processing by gas cluster ion beams | p. 242 |
Atomic level smoothing of CVD diamond films by gas cluster ion beam etching | p. 248 |
Design considerations for plasma immersion ion implantation systems | p. 252 |
Lateral implantation dose measurements of plasma immersion ion implanted non-planar samples | p. 255 |
Ion beam analysis of plasma immersion implanted silicon for solar cell fabrication | p. 259 |
Characterization of hydrogenated amorphous silicon prepared by ion beam assisted evaporation | p. 263 |
Beam scanning system for the uniformity of implanted doses in a large area | p. 267 |
Atomic scale investigation of surface modification induced by 215 MeV Ne irradiation on graphite | p. 270 |
Thin BN films obtained by dual-ion-beam sputtering: an FT-IR and . spectroscopic ellipsometry characterization | p. 275 |
Preparation of Al[subscript 2]O[subscript 3] films by a new CVD process combining plasma and accelerated ion beams | p. 280 |
Layer and interface analysis of ultra thin ion beam produced silicon nitride layers by NRA and TEM | p. 284 |
Structural, morphological, electrical and luminous properties of undoped micro/nanocrystalline silicon films deposited by ion-assisted beam deposition techniques | p. 289 |
Effects of ion irradiations on properties of polyphosphazene-silica composite films | p. 294 |
He implant-damage isolation of MOVPE grown GaAs/InGaP/InGaAsP layers | p. 298 |
Ion implantation induced damage in relaxed Si0.75Ge0.25 | p. 301 |
A study of base contact formation in epitaxial Si/Si[subscript 0.88]Ge[subscript 0.12] HBT structures | p. 305 |
Structural studies of ion beam synthesised SiGe/Si heterostructures for HBT applications | p. 311 |
Radiation damage of 2 MeV Si ions in Si[subscript 0.75]Ge [subscript 0.25]: optical measurements and damage modelling | p. 316 |
Investigation of the damage induced by 200 keV Ge[superscript +] ion implantation in 6H-SiC | p. 321 |
Ion beam synthesis of [beta]-SiC at [actual symbol not reproducible] and structural characterization | p. 325 |
XTEM and IR absorption analysis of silicon carbide prepared by high temperature carbon implantation in silicon | p. 330 |
Ion beam assisted recrystallization of SiC/Si structures | p. 334 |
Ion beam synthesis by tungsten-implantation into 6H-silicon carbide | p. 338 |
Modification of magnetron sputtered a-Si[subscript 1-x]C[subscript x]:H films by implantation of Ge[superscript +] | p. 342 |
Author index | p. 349 |
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