Metal Based Thin Films for Electronics

by Wetzig, Klaus; Schneider, Claus M.

• ISBN13: 9783527406500
• ISBN10: 3527406506
• Edition: 2nd
• Format: Hardcover
• Copyright: 2006-07-21
• Publisher: Wiley-VCH

Summary

This up-to-date handbook covers the main topics of preparation, characterization and properties of complex metal-based layer systems. The authors -- an outstanding group of researchers -- discuss advanced methods for structure, chemical and electronic state characterization with reference to the properties of thin functional layers, such as metallization and barrier layers for microelectronics, magnetoresistive layers for GMR and TMR, sensor and resistance layers. As such, the book addresses materials specialists in industry, especially in microelectronics, as well as scientists, and can also be recommended for advanced studies in materials science, analytics, surface and solid state science.

Author Biography

Klaus Wetzig studied physics at the University of Technology in Dresden, receiving his licence in 1963, his doctorate in 1967 and his habilitation in 1973. In 1975 he moved to the Academy of Sciences, and since 1992 he is Full Professor of Materials Analysis at the University of Technology in Dresden and Director at the Leibniz Institute of Solid State and Materials Research Dresden. His research interests include materials analysis and microstructures, especially electron microscopy of functional materials, characterization of thin films for electronics, and nanostructural features in general.

Claus Michael Schneider studied physics at the RWTH Aachen University receiving his diploma in 1985. He obtained his PhD in 1990 at the Free University of Berlin and his habilitation in 1996 at the Martin-Luther University Halle-Wittenberg. From 1998 to 2003 he headed the Department of thin Film Systems and Nanostructures at the Leibniz Institute of Solid State and Materials research Dresden. Since June 2003 he directs the Institute "Electronic Properties" within the department of Solid State Research(IFF) at the Forschungzentrum Julich, being jointly appointed as full professor at the University Duisburg-Essen. His research interests include solid state physics, thin film systems, surface magnetism and spintronics as well as the physics of nanostructures.

Table of Contents

Preface	XI
List of Contributors	XIII
1 Introduction	1	(6)
Klaus Wetzig, Claus M. Schneider
1.1 Prologue	1	(1)
1.2 Organization, Aim and Content of This Book	2	(5)
2 Thin Film Systems: Basic Aspects	7	(134)
2.1 Interconnects for Microelectronics	7	(21)
Ralph Spolenak, Ehrenfried Zschech
2.1.1 Introduction	7	(1)
2.1.2 Metallization Layers	8	(4)
2.1.3 Materials Science of Metallic Interconnects	12	(14)
2.1.4 Function of Barrier and Nucleation Layers and Materials Selection	26	(2)
2.2 Metallization Structures in Acoustoelectronics	28	(20)
Manfred Weihnacht
2.2.1 Introduction	28	(2)
2.2.2 Fundamentals of Surface Acoustic Waves	30	(10)
2.2.3 Interdigital Transducers (IDTs)	40	(4)
2.2.4 Reflector Gratings	44	(1)
2.2.5 Waveguides, Energy Trapping	44	(1)
2.2.6 Multistrip Couplers	45	(1)
2.2.7 Interdigital Transducers with Piezoelectric Layer	45	(2)
2.2.8 Metal Strips with Dielectric Coatings	47	(1)
2.3 Silicide Layers for Electronics	48	(23)
Joachim Schumann
2.3.1 Introduction	48	(1)
2.3.2 The Basic Chemical and Physical Properties	49	(6)
2.3.3 Preparation of Silicides	55	(7)
2.3.4 Silicides with Metallic Conductivity	62	(2)
2.3.5 Semiconducting Silicides	64	(4)
2.3.6 Heterogeneously Disordered Silicide Films	68	(3)
2.4 Complex Layered Systems for Magnetoelectronics	71	(32)
Claus M. Schneider
2.4.1 Introduction	71	(2)
2.4.2 Magnetism: A Primer	73	(1)
2.4.3 Magnetic Coupling Phenomena	74	(8)
2.4.4 Electric Transport in Layered Magnetic Systems	82	(11)
2.4.5 Functional Thin Film Systems	93	(10)
2.5 Multilayer and Single-Surface Reflectors for X-Ray Optics	103	(19)
Hermann Mai, Stefan Braun
2.5.1 Introduction	103	(2)
2.5.2 Refraction and Reflection at Single Boundaries	105	(4)
2.5.3 Bragg Reflection at 1D Lattice Systems	109	(10)
2.5.4 Multilayer Preparation	119	(3)
2.6 Metallic Layers for Photovoltaics	122	(7)
Winfried Blau
2.6.1 Introduction	122	(1)
2.6.2 Solar Cells	123	(1)
2.6.3 Functionalities of Thin Metallic Films in PV Cells	124	(5)
2.6.4 Examples	129	(1)
2.7 References	129	(12)
3 Thin Film Preparation and Characterization Techniques	141	(90)
3.1 Thin Film Preparation Methods	141	(19)
Christian Wenzel
3.1.1 Introduction	141	(2)
3.1.2 Physical Vapor Deposition	143	(10)
3.1.3 Chemical Vapor Deposition	153	(3)
3.1.4 Non Vacuum-Based Deposition	156	(4)
3.1.5 Outlook	160	(1)
3.2 Electron Microscopy and Diffraction	160	(19)
Klaus Wetzig, Jürgen Thomas
3.2.1 Transmission Electron Microscopy (TEM)-Imaging	160	(8)
3.2.2 TEM-Selected Area Electron Diffraction	168	(4)
3.2.3 In situ-SEM Methods	172	(5)
3.2.4 Electron Backscatter Diffraction	177	(2)
3.3 X-Ray Scattering Techniques	179	(18)
Michael Hecker
3.3.1 Wide Angle Diffraction	180	(10)
3.3.2 Reflectometry	190	(4)
3.3.3 Soft X-Rays and Magnetic Scattering	194	(3)
3.4 Spectroscopic Techniques	197	(17)
Klaus Wetzig
3.4.1 Element Distribution Analysis	197	(10)
3.4.2 Element Depth Profile Analysis	207	(7)
3.5 Stress Measurement Techniques	214	(11)
Winfried Brückner
3.5.1 Stress and Strain	214	(3)
3.5.2 Substrate Curvature	217	(2)
3.5.3 Measurement Techniques	219	(6)
3.6 References	225	(6)
4 Challenges for Thin Film Systems Characterization and Optimization	231	(118)
4.1 Electromigration in Metallization Layers	231	(17)
Ralph Spolenak, Horst Wendrdock, Klaus Wetzig
4.1.1 Fundamentals	231	(3)
4.1.2 Methods for Quantitative Damage Analysis	234	(3)
4.1.3 Al Interconnects	237	(4)
4.1.4 Cu Interconnects	241	(7)
4.2 Barrier and Nucleation Layers for Interconnects	248	(13)
Ehrenfried Zschech
4.2.1 Introduction	248	(1)
4.2.2 PVD Barrier Layers for Copper Interconnects	249	(6)
4.2.3 Barrier/Seed Microstructure and Step Coverage	255	(4)
4.2.4 New Barrier/Seed Concepts Using CVD and ALD	259	(1)
4.2.5 Atomic Layer Deposition (ALD)	260	(1)
4.3 Acoustomigration in Surface Acoustic Waves Structures	261	(22)
Siegfried Menzel, Klaus Wetzig
4.3.1 General Remarks	261	(1)
4.3.2 Acoustomigration Mechanism	262	(1)
4.3.3 Metallization Concepts for Power SAW Structures	263	(4)
4.3.4 Experimental Setup and SAW Technology	267	(5)
4.3.5 Acoustomigration Experiments	272	(11)
4.4 Thermal Stability of Magnetoresistive Layer Stacks	283	(12)
Claus M. Schneider, Jürgen Thomas
4.4.1 Metallic Multilayers as GMR Model Systems	284	(1)
4.4.2 Co/Cu Multilayers	285	(8)
4.4.3 Ni80Fe20/Cu Multilayers	293	(2)
4.5 Functional Magnetic Layers for Sensors and MRAMs	295	(14)
Hartmut Vinzelberg, Dieter Elefant
4.5.1 Magnetic Multilayers: Layer Thickness Dependence of the GMR Parameters	296	(5)
4.5.2 Spin Valves	301	(4)
4.5.3 Magnetic Tunnel Junctions	305	(4)
4.6 Multilayers for X-Ray Optical Purposes	309	(14)
Hermann Mai, Stefan Braun
4.6.1 Multilayers as Reflectors for X-Rays	309	(2)
4.6.2 Real Structure of nm-Multilayers	311	(8)
4.6.3 High-Resolution Multilayers	319	(3)
4.6.4 Multilayers with Uniform and Graded Period Thickness	322	(1)
4.7 Functional Electric Layers	323	(17)
Joachim Schumann, Jürgen Thomas
4.7.1 Resistance Layers	324	(8)
4.7.2 Thermoelectric Thin Films	332	(8)
4.8 References	340	(9)
5 Devices	349	(50)
5.1 Device Related Aspects for Si-Based Electronics	349	(4)
Ehrenfried Zschech
5.1.1 Interconnect Technology and Materials Trends for Memory and Logic Products	349	(1)
5.1.2 Copper Inlaid Process: Process Integration and Materials Related Topics	350	(1)
5.1.3 Wiring Hierarchy for Copper/Low-k on-Chip Interconnects	351	(2)
5.1.4 New Global Interconnect Concepts	353	(1)
5.2 SAW High Frequency Filters, Resonators and Delay Lines	353	(9)
Manfred Weihnacht
5.2.1 Introduction	353	(1)
5.2.2 Transversal Filters	354	(3)
5.2.3 Resonators	357	(3)
5.2.4 Filters with Spread Spectrum	360	(1)
5.2.5 Delay Lines	361	(1)
5.3 Sensor Devices	362	(11)
Christoph Treutler
5.3.1 Introduction	362	(1)
5.3.2 Requirements for Thin Films to be Used as Transducers	362	(1)
5.3.3 Thin Film Strain Gauges for Pressure Sensors and Force Meters	363	(1)
5.3.4 Thin Film Thermometer in a Micromachined Air-Mass Flow Meter for Automotive Applications	364	(2)
5.3.5 Magnetic Thin Films for Measuring Position, Angle, Rotational Speed and Torque	366	(7)
5.4 X-Ray Optical Systems	373	(10)
Hermann Mai, Stefan Braun
5.4.1 Basic Properties of the Combination of X-Ray Optical Elements	373	(1)
5.4.2 X-Ray Astronomy	374	(3)
5.4.3 X-Ray Microscopy	377	(1)
5.4.4 Extreme Ultraviolet Lithography (EUVL)	378	(2)
5.4.5 X-Ray Reflectometry and Diffractometry	380	(1)
5.4.6 X-ray Fluorescence Analysis	381	(2)
5.5 Thermoelectric Sensors and Transducers	383	(11)
Joachim Schumann
5.5.1 Introduction	383	(1)
5.5.2 Thermoelectric Energy Conversion — Some Basic Considerations	383	(1)
5.5.3 Thermoelectric Sensors	384	(6)
5.5.4 Thermoelectric Transducers	390	(4)
5.5.5 Outlook	394	(1)
5.6 References	394	(5)
6 Outlook	399	(6)
Klaus Wetzig, Claus M. Schneider
6.1 New Functionalities	399	(1)
6.2 Materials-Related Aspects	400	(1)
6.3 Microelectronics — Quo Vadis?	401	(1)
6.4 What You See is What You Get	402	(1)
6.5 References	403	(2)
Index	405