New Methods, Mechanics and Models of Vapor Deposition

by Wadley, H. N. G.; Gilmer, George H.; Barker, William G.

• ISBN13: 9781558995246
• ISBN10: 1558995242
• Format: Hardcover
• Copyright: 2000-09-01
• Publisher: Materials Research Society

Summary

Vapor deposition is increasingly used to synthesize thin films and coatings that underpin numerous technologies from microelectronics to aircraft engines. As the structural and compositional complexity of these vapor-deposited materials increases, many new methods of vapor deposition have been developed. The design of which is founded upon an understanding of the atomic-scale mechanisms of growth. This book explores these issues and their applications in micro- and magnetoelectronics, hard coatings, photovoltaics, high-Tc thin films and the group-three nitrides. It is organized so that many of the new methods of vapor deposition are introduced first. This is followed by chapters on vapor deposition including the use of in situ characterization techniques to observe them and exploration of modeling techniques to simulate the growth of vapor-deposited structures. The use of in situ sensors to validate simulations is also widely covered. This provides a detailed view of the state of the art and should be beneficial to all who are engaged in its research and development.

Table of Contents

Preface	xi
Materials Research Society Symposium Proceedings	xii
Surface Catalyzed Photo-Assisted MOCVD of Cobalt Thin Films for Enhanced Control of Magnetic Properties	3	(6)
M.F. Chioncel
P.W. Haycock
F.Y. Ogrin
B.L. Ruthven
J.W. Bull
A Parallel Detecting, Spectroscopic Ellipsometer for Intelligent Process Control of Continuously Deposited CIGS Films	9	(6)
L.J. Simpson
B.S. Joshi
L.A. Gonzales
J. Verley
T.E. Furtak
Real Time Substrate Temperature Control by Emissivity Compensated Pyrometry During InxGa1-xAs1-y/InP Growth on Production Scale Rotating Disc MOVPE Reactors	15	(6)
J. Ramer
B. Patel
A. Patel
V. Boguslavskiy
A. Gurary
Chemical Vapor Deposition Coating for Micromachines	21	(6)
S.S. Mani
J.G. Fleming
J.J. Sniegowski
M.P. de Boer
L.W. Irwin
J.A. Walraven
D.M. Tanner
M.T. Dugger
On the Challenges and Opportunities of Sensing Materials Growth Within Production Deposition Tools	27	(14)
John C. Bean
S. Kanakaraju
Mark Lau
Vapor Phase Synthesis of II-IV Semiconductor Nanoparticles in a Counterflow Jet Reactor	41	(6)
D. Sarigiannis
J.D. Peck
T.J. Mountziaris
G. Kioseoglou
A. Petrou
Thermodynamics of Paracrystalline Silicon	47	(6)
P.M. Voyles
M.M.J. Treacy
J.M. Gibson
Low Pressure Photo-Assisted MOCVD for the Production of Homogeneous, Low-Strain, Amorphous Titanium Oxide Films	53	(6)
P.W. Haycock
M.G. Lopez
J. Auld
J.W. Bull
E.W. Williams
Diamond Synthesis With Completely Closed EACVD Method	59	(2)
Takashi Kato
Masahiro Nishida
Yoshiki Takagi
Kinetic Monte Carlo Simulation of Dynamic Phenomena in Thin Film Growth	61	(6)
M.A. Gallivan
R.M. Murray
D.G. Goodwin
A Drastic Change in Structure and Property of TiO2 Thin Films Deposited by Metal-Organic Chemical Vapor Deposition With Deposition Temperature	67	(8)
Jeong-Hoon Park
Woon-Jo Cho
Kug-Sun Hong
Surface and Microstructural Characterization of Homoepitaxial Silicon Grown by Pulsed Laser Deposition	75	(6)
J.S. Pelt
R. Magana, Jr.
M.E. Ramsey
E. Poindexter
S. Atwell
J.P. Zheng
S.M. Durbin
M. Kobayashi
Morphological, Chemical and Structural Study of Sputtered Al/Al2O3 Multilayers	81	(6)
C. Le Paven-Thivet
P. Aubert
S. Fusil
A. Zozime
C. Malibert
Ph. Houdy
Composition and Structure of Sputter Deposited Erbium Hydride Thin Films	87	(6)
D.P. Adams
J.A. Romero
M.A. Rodriguez
J.A. Floro
J.C. Banks
Atomic Layer Deposition of Thin Films Using Sequential Surface Reactions	93	(10)
S.M. George
J.D. Ferguson
J.W. Klaus
Energetic Inert Gas Atom Impact Effects During Ion Beam Multilayer Deposition	103	(6)
X.W. Zhou
W. Zou
H.N.G. Wadley
Real Time, In Situ Curvature Measurements of Epitaxial YBCO Films on MgO	109	(6)
D. Boyd
A. Tripathi
M. Gallivan
J. Musolf
A. Rosakis
H. Atwater
D. Goodwin
Kinetic Roughening During Rare-Gas Homoepitaxy	115	(8)
E. Nabighian
M.C. Bartlet
X.D. Zhu
Diamond CVD Growth Mechanisms and Reaction Rates From First-Principles	123	(6)
I.I. Oleinik
D.G. Pettifor
A.P. Sutton
C.C. Battaile
D.J. Srolovitz
J.E. Butler
D.S. Dandy
S.J. Harris
M.P. D'Evelyn
The Influence of Clusters on Vapor-Deposited Thin Films: Atomistic Simulations	129	(6)
J. Dalla Torre
G.H. Gilmer
F.H. Baumann
P.O. Sullivan
M. Djafari Rouhani
Sputter Deposition of GMR Spin Valves	135	(6)
W. Zou
X.W. Zhou
J.J. Quan
Y.G. Yang
H.N.G. Wadley
D. Brownell
D. Wang
S. Ghosal
D. Subhas
Robert Kosut
Jon Ebert
Simulation of 3D Films Deposited by Glancing Angle Deposition Using 3D-Films	141	(6)
T. Smy
D. Vick
M.J. Brett
S.K. Dew
A.T. Wu
J.C. Sit
K.D. Harris
Modeling of Ionized Magnetron Sputtering of Copper	147	(6)
M.O. Bloomfield
T.S. Cale
Comprehensive Reactor-Scale Modeling of III-V Ternary Compound Growth by MOVPE	153	(6)
E.V. Yakovlev
R.A. Talalaev
S. Yu. Karpov
Yu.A. Shpolyanskiy
Yu.N. Makarov
S.A. Lowry
Optimal Design of Reactors for Metalorganic Vapor Phase Epitaxy of Group III Nitrides	159	(6)
R.P. Pawlowski
C. Theodoropoulos
T.J. Mountziaris
H.K. Moffat
J. Han
E.J. Thrush
Computational Experiment on CVD of SiC: Growth Rate, C/Si Ratio, Parasitic Phase Formation	165	(6)
Andrei N. Vorob'ev
Alexandre E. Komissarov
Maxim V. Bogdanov
Sergey Yu. Karpov
Olga V. Bord
Alexandre I. Zhmakin
Andrei A. Lovtsus
Yuri N. Makarov
Bonding and Cohesive Properties of Cobalt/Alumina Magnetic Tunnel Junctions	171	(6)
I.I. Oleinik
E.Yu. Tsymbal
D.G. Pettifor
Excimer Pulsed Laser Ablated Molecular Beam Evaporation for the Deposition of Binary Skutterudites	177	(6)
H-A. Durand
A. Suzuki
K. Nishimoto
K. Ito
I. Kataoka
Atomistic Modeling of Ultrathin Fe Films on Cu (111)	183	(6)
A. Rakotomahevitra
L.T. Wille
M.S. Rakotomalala
Nitrogen Incorporation and Growth Kinetics of GaAsN/GaAs Epilayers Grown by MOVPE	189	(6)
Laurent Auvray
Herve Dumont
Jacques Dazord
Yves Monteil
Jean Bouix
Diamond Synthesis on Glassy Substrate With Completely Closed Reaction Chamber	195	(4)
Rie Hayashi
Fumitomo Onishi
Mayu Uede
Yoshiki Takagi
High-Jc YBCO Conductors Fabricated By Magnetron Deposition	199	(6)
N. Savvides
S. Gnanarajan
J. Herrmann
A. Thorley
A. Katsaros
A. Molodyk
Strongly (111) Oriented Metallization by Ion Plating Method	205	(6)
T. Kudo
S. Sakuragi
S. Masui
K. Kinoshita
H. Makino
M. Tanaka
Atomic Layer Deposition of TiN on Si (100) and (111) Substrates	211	(6)
Hyeongtag Jeon
Jae-Hyoung Koo
June-Woo Lee
Young-Seok Kim
K.M. Kang
Yang Do Kim
Young Do Kim
Microstructure and Nanomechanical Properties of Amorphous Carbon Thin Films Prepared by Pulsed Laser Deposition in Various Atmospheres	217	(6)
Q. Wei
S. Yamolenko
J. Sankar
A.K. Sharma
Y. Yamagata
J. Narayan
In Situ Analysis Gaseous Species for CVD Diamond Synthesis and the Possible Reaction Model	223	(4)
Mayu Uede
Yoshiki Takagi
Modeling of PVT Growth of Bulk SiC Crystals: General Trends and 2'' to 4'' Reactor Scaling	227	(8)
M.S. Ramm
A.V. Kulik
I.A. Zhmakin
S.Yu. Karpov
O.V. Bord
S.E. Demina
Yu.N. Makarov
A Hollow-Cathode Transient Plasma Process for Thin Film Growth	235	(6)
S. Witanachchi
P. Mahawela
P. Mukherjee
Synthesis and Characterization of α-Alumina Films Via Combustion Chemical Vapor Deposition	241	(6)
G. Grandinetti
S. Shanmugham
M.R. Hendrick
J.M. Hampikian
Author Index	247	(2)
Subject Index	249