Nonvolatile Memory Technologies with Emphasis on Flash: A Comprehensive Guide to Understanding and Using Flash Memory Devices

by Editor: Joe Brewer (University of Florida); Editor: Manzur Gill (Forman Christian College, Pakistan)

• ISBN13: 9780470181348
• ISBN10: 0470181346
• Format: eBook
• Copyright: 2008-01-01
• Publisher: Wiley-IEEE Press

Summary

The authoritative reference guide for nonvolatile memory users Presented here is an all-inclusive treatment of Flash technology, includingFlash memory chips, Flash embedded in logic, binary cell Flash, and multilevel cell Flash. Comprised of thirteen succinct chapters authored by pioneers in the field, this book begins with a brief tutorial of elementary concepts to orient readers who are less familiar with the subject. Next, it builds upon this foundation to cover all aspects and variations of Flash technology at a mature engineering level: basic device structures, principles of operation, related process technologies, circuit design, overall design tradeoffs, device testing, reliability, and applications. Nonvolatile Memory Technologies with Emphasis on Flash seamlessly gathers together information on the complex group of technologies that make up nonvolatile memory into one well-organized book. While providing a detailed view of state-of-the-art mainline technologies that are currently being produced in high volume, it also explores less-exposed and alternate technologies that may emerge in the future. Written as a general reference, Nonvolatile Memory Technologies with Emphasis on Flash serves as both an ideal supplemental text for undergraduate and graduate courses on nonvolatile memory and as an invaluable resource for engineers, technical managers, and other sophisticated practitioners.

Table of Contents

Foreword

Preface

Contributors

Introduction To Nonvolatile Memory

Introduction

Elementary Memory Concepts

Unique Aspects of Nonvolatile Memory

Flash Memory and Flash Cell Variations

Semiconductor Device Technology Generations

Flash Memory Applications

Introduction

Code Storage

Data Storage

Code+Data Storage

Conclusion

Memory Circuit Technologies

Introduction

Flash Cell Basic Operation

Flash Memory Architecture

Redundancy

Error Correction Coding (ECC)

Design for Testability (DFT)

Flash-Specifi c Circuit Techniques

Physics Of Flash Memories

Introduction

Basic Operating Principles and Memory Characteristics

Physics of Programming and Erase Mechanisms

Physics of Degradation and Disturb Mechanisms

Conclusion

Nor Flash Stacked And Split-Gate Memory Technology

Introduction

ETOX Flash Cell Technology

SST SuperFlash EEPROM Cell Technology

Reliability Issues and Solutions

Applications

NAND Flash Memory Technology

Overview of NAND EEPROM

NAND Cell Operation

NAND Array Architecture and Operation

Program Threshold Control and Program Vt Spread Reduction

Process and Scaling Issues

Key Circuits and Circuit/Technology Interactions

Multilevel NAND

Dinor Flash Memory Technology

Introduction

DINOR Operation and Array Architecture

DINOR Technology Features

DINOR Circuit for Low-Voltage Operation

Background Operation Function

P-Channel DINOR Architecture

P-Channel Flash Memory Technology

Introduction

Device Structure

Operations of P-Channel Flash

Array Architecture of P-Channel Flash

Evolution of P-Channel Flash

Processing Technology for P-Channel Flash

Embedded Flash Memory

Introduction

Embedded Flash Versus Stand-Alone Flash Memory

Embedded Flash Memory Applications

Embedded Flash Memory Cells

Embedded Flash Memory Design

Tunnel Dielectrics For Scaled Flash Memory Cells

Introduction

SiO2 as Tunnel Dielectric-Historical Perspective

Early Work on Silicon Nitride as a Tunnel Dielectric

Jet-Vapor Deposition Silicon Nitride Deposition

Properties of Gate-Quality JVD Silicon Nitride Films

Deposited Silicon Nitride as Tunnel Dielectric

N-Channel Floating-Gate Device with Deposited Silicon Nitride Tunnel Dielectric

P-Channel Floating-Gate Device with Deposited Silicon Nitride Tunnel Dielectric

Reliability Concerns Associated with Hot-Hole Injection

Tunnel Dielectric for SONOS Cell

Prospects for High-K Dielectrics

Tunnel Barrier Engineering with Multiple Barriers

Summary

Flash Memory Reliability

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