Particles on Surfaces: Detection, Adhesion and Removal, Volume 7

by Mittal,Kash L.; Mittal,Kash L.

• ISBN13: 9789067643726
• ISBN10: 9067643726
• Edition: 1st
• Format: Nonspecific Binding
• Copyright: 2002-09-01
• Publisher: CRC Press

Summary

This volume documents the proceedings of the 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Newark, NJ, June 19-21, 2000. The study of particles on surfaces is extremely important in a host of diverse technological areas, ranging from microelectronics to optics to biomedical.This volume contains a total of 28 papers, which were all properly peer reviewed, revised and edited before inclusion. Therefore, this book is not merely a collection of unreviewed manuscripts, but rather represents information which has passed peer scrutiny. Furthermore, the authors were asked to update their manuscripts, so the information contained in this book should be current and fresh.This volume is divided into two parts: 1) Particle Analysis and General Cleaning-Related Topics; and 2) Particle Adhesion and Removal. The topics covered include: surface analysis techniques for particle identification; cleaning, rinsing and drying issues in post-CMP cleaning; fundamental forces involved in particle adhesion; factors affecting adhesion of small (nanosize) particles; factors important in particle detachment; particle adhesion measurement by AFM; various (wet and dry) techniques for particle removal, e.g., laser, ultrasonic, megasonic, use of surfactants; toner particles and pharmaceutical particles.This volume offers a wealth of information on the tremendously technologically important field of particles on surfaces and should provide a consolidated source of current R&D activity in this arena. Therefore, it will be of value and use to anyone interested in the topic of particles on surfaces.

Table of Contents

Preface	ix
Part 1: Particle Analysis and General Cleaning-Related Topics
Applying surface analysis techniques for particle identification	3	(8)
W.F. Stickle
Total reflection and grazing emission X-ray fluorescence spectrometry: Assessment of the size of contaminant particles on silicon wafer surfaces	11	(16)
H. Schwenke
P.A. Beaven
J. Knoth
Development of a particle deposition meter	27	(14)
D. Semleit
A. Trampe
H. Fissan
Reduction of cleaning and verification times for an aqueous based process by on-line monitoring	41	(16)
A.J. Pervan
J. Grilly
S.L. Lim
R. Kaiser
Implementation of the IMEC-cleaning in advanced CMOS manufacturing	57	(12)
M. Meuris
S. Arnauts
I. Cornelissen
K. Kenis
M. Lux
S. de Gendt
P.W. Mertens
I. Teerlinck
R. Vos
L. Loewenstein
M.M. Heyns
K. Wolke
Cleaning, rinsing and drying issues in post-Cu CMP cleaning: A case study	69	(28)
W. Fyen
R. Vos
E. Vrancken
J. Grillaert
M. Meuris
M. Heyns
Aging effects in test silicon wafers prepared for wafer cleaning process evaluation	97	(16)
N. Narayanswami
G. Thomes
J. Weygand
J. Butterbaugh
S.-H. Yoo
B. Liu
D. Paul
J. Scherer
L. Davis
K. Childs
Part 2: Particle Adhesion and Removal
Adhesion of small particles and innovative methods for their removal	113	(38)
R. Kohli
Effects of surface roughness on van der Waals and electrostatic contributions to particle-particle interactions and particle adhesion	151	(20)
J.Y. Walz
N. Sun
Effect of surface hydrophobicity on the detachment of particles from surfaces	171	(18)
M.M. Sharma
A.M. Freitas
Adhesion and removal of particles from charged surfaces under a humidity-controlled air stream	189	(8)
P. Schmitz
J. Cardot
Adhesion measurements by AFM and surface energy characteristics by IGC of xerographic toner particles under different mechanical and environmental conditions	197	(22)
L.H.G.J. Segeren
F.G. Karssenberg
J.P. Pickering
J.W.A. van den Berg
G.J. Vancso
Measurements of adhesion forces in pharmaceutical powder-polymer systems by atomic force microscopy	219	(16)
E. Beach
J. Drelich
R. Han
Direct adhesion measurements between pharmaceutical materials	235	(18)
F.M. Etzler
T.H. Ibrahim
T.R. Burk
R.D. Neuman
Laser assisted particle removal	253	(8)
S.D. Allen
K. Imen
Laser removal of particles from solid surfaces	261	(14)
Y.F. Lu
W.D. Song
L. Zhang
B. Luk'yanchuyk
Y.W. Zheng
W.J. Wang
Y. Zhang
M.H. Hong
T.C. Chong
Laser assisted particle removal from silicon wafers	275	(20)
M. Mosbacher
H.-J. Munzer
M. Bertsch
V. Dobler
N. Chaoui
J. Siegel
R. Oltra
D. Bauerle
J. Boneberg
P. Leiderer
Laser cleaning of silicon membrane stencil masks	295	(14)
W. Zapka
C. Gollasch
R. Lilischkis
A. Ehrmann
K.F. Zapka
Transient laser-based surface acceleration simulations for particle removal	309	(16)
C. Li
C. Wu
C. Cetinkaya
Particle removal from semiconductor substrates using the PLASMAX technology	325	(16)
J.B. Bailey
J.J. Festa
A.S. Geller
Particle removal with ultrasonics and megasonics	341	(14)
S.B. Awad
Influence of temperature and dissolved air on megasonic particle removal	355	(22)
T.H. Kuehn
C.H. Yang
D.B. Kittelson
A study of particle removal based on Monte Carlo simulation of ion interactions	377	(18)
F. Tardif
I. Constant
R.J.-M. Pellenq
A. Delville
Removal of fibrin coated particles from surfaces	395	(10)
S. Lorthois
P. Schmitz
Enhancement of particle removal and modification of interfacial phenomena using surfactants	405	(14)
M.L. Free
D.O. Shah
The enhancement of particle removal by adding Valtron SP2200 surfactant into SC1 solution	419	(8)
L. Liu
S. Verhaverbeke
Optimization of particle removal performance of dHF-based cleaning recipes	427	(16)
R. Vos
I. Cornelissen
K. Xu
W. Fyen
P. Mertens
M. Meuris
M. Heyns
Spray cleaning with hydrofluorocarbon solutions	443
R. Kaiser
R.S. Miller
J.T. Cardin