Plasma Etching Fundamentals and Applications

by Sugawara, M.; Stansfield, Barry L.; Handa, S.; Fujita, K.; Watanabe, S.; Tsukamoto, T.

• ISBN13: 9780198562870
• ISBN10: 019856287X
• Format: Hardcover
• Copyright: 1998-07-30
• Publisher: Oxford University Press

Summary

This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

Table of Contents

1. Introduction	1	(13)
1.1. Why do we need plasma?	1	(1)
1.2. Plasmas	2	(11)
References	13	(1)
2. RF discharges	14	(52)
2.1. Comparison with DC discharges	14	(21)
2.2. Construction and maintenance of the RF discharge	35	(27)
2.3. Summary of RF discharge characteristics	62	(1)
References	63	(3)
3. Physical basis of the plasma etching process	66	(35)
3.1. Process requirements for plasma etching	66	(3)
3.2. Main characterizing parameters for plasma etching	69	(1)
3.3. Summary of the etching model	98	(1)
References	99	(2)
4. Plasma particles and potentials	101	(79)
Barry L. Stansfield
4.1. Introduction	101	(1)
4.2. Probes	102	(32)
4.3. Particle energy analysers	134	(9)
4.4. Mass spectrometry	143	(2)
4.5. Microwave interferometry	145	(3)
4.6. Spectroscopy	148	(24)
4.7. Summary	172	(1)
References	173	(7)
5. Technology of reactive ion etching	180	(32)
S. Handa
5.1. Introduction	180	(5)
5.2. Reactive ion etching	185	(2)
5.3. Etching processes	187	(8)
5.4. Qualification of RIE apparatus	195	(13)
5.5. Future aspects of RIE	208	(2)
5.6. Summary	210	(1)
References	210	(2)
6. Magnetic field coupled etchers	212	(40)
K. Fujita
6.1. Introduction	212	(1)
6.2. RF magnetron-type plasma discharges	213	(14)
6.3. Effects of the magnetic field configuration on the two-dimensional ion behaviour in ECR microwave plasmas	227	(10)
6.4. Large-diameter ECR microwave plasma production with ring-type slot antennas	237	(7)
6.5. RF plasma production based on a new principle of `electron sheath resonance'	244	(4)
6.6. Summary	248	(1)
References	249	(3)
7. ECR plasma etchers	252	(65)
S. Watanabe
7.1. Introduction	252	(4)
7.2. ECR plasma theory	256	(11)
7.3. ECR plasma generation	267	(26)
7.4. ECR plasma etching	293	(15)
7.5. Summary	308	(6)
References	314	(3)
8. Future prospects of plasma etching	317	(24)
T. Tsukamoto
8.1. Introduction	317	(1)
8.2. An approach to large-diameter etching	318	(10)
8.3. An approach to precise pattern fabrication	328	(7)
8.4. Approaches to damage-free etching	335	(2)
8.5. Summary	337	(1)
References	338	(3)
Index	341