Polymers for Microelectronics and Nanoelectronics

by Lin, Qinghuang; Pearson, Raymond A.; Hedrick, Jeffrey C.

• ISBN13: 9780841238572
• ISBN10: 084123857X
• Format: Hardcover
• Copyright: 2004-04-01
• Publisher: American Chemical Society
• More Book Details

Summary

Discusses patterning, insulating, and packaging polymeric materials for the $150-billion microelectronics industry as well as the rapidly emerging nanoelectronics and organic electronics industries. Chapters discuss patterning, insulating, and packaging polymeric materials as well as organic materials for nanoelectronics, organic electronics, and optoelectronics. This book covers the synthesis, characterization, structure-property relationship, performance, and applications of these materials.

Table of Contents

Preface	xi
1. Recent Progress in Materials for Organic Electronics	1	(14)
Zhenan Bao
2. PPV Nanotubes, Nanorods, and Nanofilms as well as Carbonized Objects Derived Therefrom	15	(15)
Kyungkon Kim, Guolun Zhong, Jung-Il Jin, Jung Ho Park, Seoung Hyun Lee, Dong Woo Kim, Yung Woo Park, and Whikun Yi
3. Layer-by-Layer Assembly of Molecular Materials for Electrooptical Applications	30	(14)
M.E. van der Boom and T.J. Marks
4. Oxidative Solid-State Cross-Linking of Polymer Precursors to Pattern Intrinsically Conducting Polymers	44	(10)
Sung-Yeon Jang, Manuel Marquez, and Gregory A. Sotzing
5. Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography	54	(18)
T.H. Fedynyshyn, W.A. Mowers, R.R. Kunz, R.F. Sinta, M. Sworin, A. Cabral, and J. Curtin
6. 157-nm Resist Materials Using Main-Chain Fluorinated Polymers	72	(14)
Toshiro Itani, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Naomi Shida, and Minoru Toriumi
7. Correlation of the Reaction Front with Roughness in Chemically Amplified Photoresists	86	(12)
Ronald L. Jones, Vivek M. Prabhu, Dario L. Goldfarb, Eric K. Lin, Christopher L. Soles, Joseph L. Lenhart, Wen-li Wu, and Marie Angelopoulos
8. Utilizing Near Edge X-ray Absorption Fine Structure to Probe Interfacial Issues in Photolithography	98	(20)
Joseph L. Lenhart, Daniel A. Fischer, Sharadha Sambasivan, Eric K. Lin, Christopher L. Soles, Ronald L. Jones, Wen-li Wu, Dario L. Goldfarb, and Marie Angelopoulos
9. Photolabile Ultrathin Polymer Films for Spatially Defined Attachment of Nano Elements	118	(11)
B. Voit, F. Braun, Ch. Loppacher, S. Trogisch, L.M. Eng, R. Seidel, A. Gorbunoff, W. Pompe, and M. Mertig
10. Soft Lithography on Block Copolymer Films: Generating Functionalized Patterns on Block Copolymer Films as a Basis to Further Surface Modification	129	(15)
Martin Brehmer, Lars Conrad, Lutz Funk, Dirk Allard, Patrick Theato, and Anke Helfer
11. Nanoporous, Low-Dielectric Constant Organosilicate Materials Derived from Inorganic Polymer Blends	144	(17)
R.D. Miller, W. Volksen, V.Y. Lee, E. Connor, T. Magbitang, R. Zafran, L. Sundberg, C.J. Hawker, J.L. Hedrick, E. Huang, M. Toney, Q.R. Huang, C.W. Frank, and H.-C. Kim
12. Porous Low-k Dielectrics: Material Properties	161	(12)
C. Tyberg, E. Huang, J. Hedrick, E. Simonyi, S. Gates, S. Cohen K. Malone, H. Wickland, M. Sankarapandian, M. Toney, H.-C. Kim, R. Miller, W. Volksen, P. Rice, and L. Lurio
13. Ultra Low-k Dielectric Films with Ultra Small Pores Using Poragens Chemically Bonded to Siloxane Resin	173	(14)
Bianxiao Zhong and Eric S. Moyer
14. Design of Nanoporous Polyarylene Polymers for Use as Low-k Dielectrics in Microelectronic Devices	187	(12)
H. Craig Silvis, Kevin J. Bouck, James P. Godschalx, Q. Jason Niu, Michael J. Radler, Ted M. Stokich, John W. Lyons, Brandon J. Kern, Joan G. Marshall, Karin Syverud, and Mary Leff
15. Molecular Brushes as Templating Agents for Nanoporous SiLK* Dielectric Films	199	(10)
Q. Jason Niu, Steven J. Martin, James P. Godschalx, and Paul H. Townsend
16. X-ray Reflectivity as a Metrology to Characterize Pores in Low-k Dielectric Films	209	(14)
Christopher L. Soles, Hae-Jeong Lee, Ronald C. Hedden, Da-wei Liu, Barry J. Bauer, and Wen-li Wu
17. Micro- and Nanoporous Materials Developed Using Supercritical CO2: Novel Synthetic Methods for the Development of Micro- and Nanoporous Materials Toward Microelectronic Applications	223	(13)
Sara N. Paisner and Joseph M. DeSimone
18. Thermally Degradable Photocross-Linking Polymers	236	(15)
Masamitsu Shirai, Satoshi Morishita, Akiya Kawaue, Haruyuki Okamura, and Masahiro Tsunooka
19. Evaluation of Infrared Spectroscopic Techniques to Assess Molecular Interactions	251	(13)
Robert K. Oldak and Raymond A. Pearson
20. Study on Metal Chelates as Catalysts of Epoxy and Anhydride Cure Reactions for No-Flow Underfill Applications	264	(15)
Zhuqing Zhang and C.P. Wong
21. Benzocyclobutene-Based Polymers for Microelectronic Applications	279	(15)
Ying-Hung So, Phil E. Garrou, Jang-Hi Im, and Karou Ohba
22. Formation of Nanocomposites by In Situ Intercalative Polymerization of 2-Ethynylpyrdine in Layered Aluminosilicates: A Solid-State NMR Study	294	(15)
A.L. Cholli, S.K. Sahoo, D.W. Kim, J. Kumar, and A. Blumstein
Indexes
Author Index	309	(2)
Subject Index	311