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9780471181729

Spectroscopic Ellipsometry and Reflectometry A User's Guide

by ;
  • ISBN13:

    9780471181729

  • ISBN10:

    0471181722

  • Edition: 1st
  • Format: Hardcover
  • Copyright: 1999-03-18
  • Publisher: Wiley-Interscience
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Supplemental Materials

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Summary

While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers in a variety of disciplines, it addresses a broad range of applications in physics, chemistry, electrical engineering, and materials science.

Author Biography

Harland Tompkins retired from full-time employment in 2001. During his full-time employment, he was employed by General Electric Co., Bell Laboratories, the Idaho National Engineering Lab, and Motorola.

William A. McGahan is the author of Spectroscopic Ellipsometry and Reflectometry: A User's Guide, published by Wiley.

Table of Contents

Preface xiii
Perspective and History
1(5)
Historical Aspects
1(1)
Complementary Nature of the Techniques
2(1)
Format and Purpose of the Book
3(1)
References
4(2)
Fundamentals
6(17)
Description of an Electromagnetic Wave
6(2)
The Effect of Matter on Electromagnetic Waves
8(3)
The Complex Index of Refraction
8(2)
Laws of Reflection and Refraction
10(1)
Polarized Light
11(3)
Sources
11(1)
Linearly Polarized Light
11(1)
Elliptically Polarized Light
12(2)
Application of Elliptically Polarized Light
14(1)
The Reflection of Light
14(5)
Orientation
14(1)
The Reflection Equations of Fresnel
15(1)
The Brewster Angle
15(3)
Reflections with Films
18(1)
Ellipsometry and Reflectometry Definitions
19(2)
Reflectance
19(1)
Delta and Psi
20(1)
The Fundamental Equation of Ellipsometry
20(1)
References
21(2)
Optical Properties of Materials and Layered Structures
23(12)
The Physical Meaning of the Optical Constants
23(1)
Conventions and More Basics
24(2)
The Lorentz Oscillator
26(2)
Insulators
28(1)
Semiconductors
29(2)
Metals
31(2)
Kramers-Kronig Relations
33(1)
Miscellaneous
33(1)
References
34(1)
Instrumentation
35(19)
Introduction
35(1)
Reflectometry in General
35(1)
Reflectometer Hardware Configurations
36(3)
Reflectometer Components
39(1)
Sources
39(1)
Beamsplitter
39(1)
Lenses
39(1)
Monochromators and Detectors
39(1)
Ellipsometry in General
40(1)
Optical Components Used in Ellipsometers
40(4)
Sources
40(1)
Polarizers
41(1)
Compensators
42(1)
Monochromators
42(2)
Detectors
44(1)
Ellipsometer Hardware Configurations
44(5)
Null Ellipsometry
44(1)
Rotating Element Photometric Ellipsometry
45(3)
Modulation Ellipsometry
48(1)
Single Wavelength Ellipsometers
49(1)
Spectroscopic Ellipsometers
49(1)
Instrument Parameter Characterization
50(1)
Research vs. Production Ellipsometry
50(2)
Errors in Reflectance and Ellipsometric Measurements
52(1)
References
53(1)
The Anatomy of a Reflectance Spectrum
54(8)
General
54(1)
Spectra for Substrates Only
54(1)
With a Film: The Effect of Wavelength
55(2)
Contribution of Film Thickness
57(2)
Contribution of the Optical Constant Spectra of Film and Substrate
59(2)
Summary
61(1)
Aspects of Single-Wavelength Ellipsometry
62(13)
General
62(1)
Substrates: Delta and Psi and the Optical Constants
62(4)
Calculating Delta/Psi Trajectories
66(1)
Delta/Psi Trajectories for Transparent Films
67(4)
Delta/Psi Trajectories for Absorbing Films
71(1)
Trajectories for Two-Film Structures
72(1)
Key Issues
73(1)
References
74(1)
The Anatomy of an Ellipsometric Spectrum
75(10)
General
75(1)
Typical Spectra
75(2)
Spectra for Substrates Only
77(1)
With a Film: Single-Wavelength Considerations
77(2)
Effect of Wavelength
79(2)
Contribution of the Optical Constant Spectra of Film and Substrate
81(1)
Contribution of Film Thickness
82(1)
Summary
83(1)
References
84(1)
Analytical Methods and Approach
85(13)
General Approach
85(1)
Sample Positioning
85(1)
How Much Data?
86(2)
Wavelength
86(1)
Angle of Incidence
87(1)
Analytical Methods
88(9)
General
88(1)
Tabulated Optical Constants
89(1)
Simple Mixtures of Tabulated Optical Constants
90(3)
Dispersion Relationships
93(2)
Point-by-Point Optical Constants
95(1)
Regression Process
96(1)
Summary
97(1)
References
97(1)
Optical Data Analysis
98(10)
Introduction
98(1)
Direct Calculation
99(2)
Regression Analysis Methods
101(2)
The Problem
101(1)
The Merit Function
101(1)
The Regression Algorithm
102(1)
Hybrid Methods
103(1)
Goodness of Fit
103(1)
Uniqueness
104(1)
Combined Analysis of Multiple Data Types
105(1)
Multiple Sample Analysis
106(1)
Errors---Systematic and Random
106(1)
References
107(1)
Quality Assurance
108(5)
General
108(1)
Precision vs. Accuracy
108(1)
Standards
109(1)
Quality Assurance Measurements
110(2)
References
112(1)
Very Thin Films
113(10)
Introduction
113(1)
Determining Thickness
113(4)
For Reflectance
113(2)
For Ellipsometry
115(2)
Determining Optical Constants
117(1)
Distinguishing Between Materials
118(4)
References
122(1)
Roughness
123(10)
Introduction
123(1)
Roughness in General
123(1)
Approximation of Surface Roughness as an Oxide Layer
124(1)
Effective Medium Approximations (EMAs)
125(1)
Examples
126(4)
Polysilicon
126(1)
Sensitivity in the Visible
127(1)
Roughness Effects when Determining Optical Constants
128(1)
SOI Interface Roughness
128(2)
References
130(3)
PROTOTYPICAL ANALYSES
Thermal Oxide, LPCVD Nitride, or Photoresist on Silicon
133(5)
Salient Feature
133(1)
Thinner Films
133(2)
Intermediate Films
135(1)
Thicker Films
136(2)
Silicon Oxynitrides, PECVD Silicon Oxides, and Polysilicon
138(9)
Salient Feature
138(1)
Polysilicon
138(3)
PECVD Silicon Oxides
141(1)
Silicon Oxynitrides
142(4)
References
146(1)
PECVD Silicon Nitride, Silicon Dioxide, and Photoresist on Silicon
147(8)
Salient Feature
147(1)
Cauchy Modeling
147(8)
LPCVD Polysilicon and Amorphous Silicon
155(6)
Salient Feature
155(1)
The Problem
155(1)
The Optical Constants
155(1)
Using the EMA Model
156(1)
Using the Lorentz Oscillator Dispersion Model
156(4)
References
160(1)
Substrate Optical Constant Determination
161(5)
Salient Feature
161(1)
Aluminum
161(2)
Glass
163(3)
Analysis of Films on Transparent Substrates
166(7)
Salient Feature
166(1)
The Structure of the Example
166(1)
Transmission
166(1)
Reflection
167(2)
Ellipsometry
169(1)
Reverse Ellipsometry
170(1)
Summary
171(1)
References
172(1)
Very Thick Films
173(5)
Salient Feature
173(1)
Thick Photoresist on Silicon---Reflectometry
173(2)
Thick Photoresist on Glass---Ellipsometry
175(1)
Conclusion
176(2)
Compositional Analysis of Materials
178(3)
Salient Feature
178(1)
Background
178(1)
GaAs/AlGaAs/GaAs
179(1)
References
180(1)
Thin Metal Films
181(7)
Salient Feature
181(1)
Background
181(1)
Thin Titanium on Silicon
182(1)
Thin Titanium Nitride on Oxide on Silicon
182(2)
Using Multiple Films of Thin Metal
184(3)
Comments and Summary
187(1)
References
187(1)
Photoresist Optical Constants
188(7)
Salient Feature
188(1)
Background
188(1)
Photoresist on Silicon
189(1)
Summary
190(5)
Appendices
A Regression Algorithms 195(1)
A.1 The Merit Function 195(1)
A.2 The Analysis Procedure 195(1)
A.3 The Algorithms 196(1)
A.4 The Combination 197(1)
A.5 References 198(1)
B Maxwell's Equations and the Wave Equation 199(1)
B.1 Introduction 199(2)
B.2 Differential Equation Form of Maxwell's Equations 201(1)
B.3 The Wave Equation 201(1)
B.3.1 Dielectric Media 201(3)
B.3.2 Including Conductors 204(1)
B.3.3 The Magnetic Field Wave 205(2)
B.4 References 207(1)
B.5 Vector Calculus Notation Review 207(1)
B.5.1 Vector Algebra 207(1)
B.5.2 Scalar and Vector Fields 208(1)
B.5.3 Vector Calculus 208(4)
C Snell's Law, Fresnel's Equations, and the Total Reflection Coefficient Derivations and Historical Perspective 212(1)
C.1 Introduction 212(1)
C.2 Reflection and Refraction (Snell's Law) 212(4)
C.3 Fresnel's Reflection and Transmission Coefficients 216(4)
C.4 Using the Complex Index of Refraction 220(1)
C.5 Total Reflection Coefficient for a Film on a Substrate 221(3)
C.6 References 224(1)
Index 225

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