Transmission Electron Microscopy in Micro-nanoelectronics

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  • Format: Hardcover
  • Copyright: 2012-12-26
  • Publisher: Iste/Hermes Science Pub

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This book presents in a simple and practical way the new quantitative techniques based on transmission electron microscopy which have been recently invented or developed to address most of the main challenging issues scientists and process engineers have to face to develop or optimize semiconductor layers and devices.

Table of Contents


Chapter 1 Strain mapping using diffraction techniques NBD (Leti XX), CBED

Chapter 2 Strain mapping using GPA/HREM

Chapter 3 Dopant mapping using bright field TEM

Chapter 4 Strain mapping using dark field holography

Chapter 5 Interdiffusion and chemical reaction at interfaces by EELS

Chapter 6 Dopant segregation using STEM-EELS

Chapter 7 Chemical imaging using STEM-HAADF

Chapter 8 Characterization of process induced defects

Chapter 9 Specimen preparation by FIB

Chapter 10 Magnetic mapping using bright field holography

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